APA

Geints Y. E., Minin O. V., Minin I. V. & Zemlyanov Y. E.Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks. : .

Chicago

Geints Yu E, Minin O V, Minin I V and Zemlyanov Yu E.Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks. : .

Harvard

Geints Y. E., Minin O. V., Minin I. V. and Zemlyanov Y. E.Self-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks. : .

MLA

Geints Yu E, Minin O V, Minin I V and Zemlyanov Yu E.: . .