Preparation of nickel-containing conductive amorphous carbon films by magnetron sputtering with negative high-voltage pulsed substrate bias
20220309d2018 k y0engy50 ba
- Title screen
электронный ресурс
труды учёных ТПУ
metal-containing amorphous carbon
sputter deposition
substrate bias
ion bombardment
nano-particles
- Title screen
электронный ресурс
труды учёных ТПУ
metal-containing amorphous carbon
sputter deposition
substrate bias
ion bombardment
nano-particles