APA

Grenadyorov A. S., Oskirko V. O., Solovjev A. A., Semenov V. A., Rabotkin S. V., Oskomov K. V. & Sypchenko V. S.Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings. : .

Chicago

Grenadyorov A S, Oskirko V O, Solovjev A A, Semenov V A, Rabotkin S V, Oskomov K V and Sypchenko V S.Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings. : .

Harvard

Grenadyorov A. S., Oskirko V. O., Solovjev A. A., Semenov V. A., Rabotkin S. V., Oskomov K. V. and Sypchenko V. S.Kinetics of plasma-assisted chemical vapor deposition combined with inductively excited RF discharge and properties of a-C:H:SiOx coatings. : .

MLA

Grenadyorov A S, Oskirko V O, Solovjev A A, Semenov V A, Rabotkin S V, Oskomov K V and Sypchenko V S.: . .