Title from the title-page.

[References: p. 468 (10 tit.)]

The adhesion of a titanium film to a silicon substrate, film nanohardness, Young modulus, and other properties have been investigated depending on a distance from a sputtered target to substrate and a thickness of the deposited film. Films were deposited from the ablation plasma formed under a pulsed high-power ion beam impinging on the titanium target. The analysis of experimental data has shown that at a given film thickness, the adhesion strength increases with increasing target-substrate distance; this dependence is stronger for thinner films. Adhesion significantly reduces as the film thickness increases, and this dependence is stronger at larger target-substrate distances. The friction coefficient of a diamond Rockwell indenter moving along the film considerably decreases, whereas the film nanohardness and Young modulus at a given indentation load grow as the target-substrate distance increases.

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