Modeling Processes in Oxide-Silicate Systems Treated by Plasma for the Purpose of Improving Coating Quality / V. I. Otmakhov [et al.]

Уровень набора: Glass and Ceramics = 2004Альтернативный автор-лицо: Otmakhov, V. I.;Vereshchagin, V. I., Russian scientist of chemical engineering, Professor of silicates technology of Tomsk Polytechnic University, 1942-, Vladimir Ivanovich;Mokrousov, G. M.;Abakumova, E. P.Язык: английский.Страна: .Резюме или реферат: Modeling of high-temperature processes in oxide-silicate systems under the effect of plasma is performed. The research is implemented with plasma guns used in analytical chemistry for atom-emission analysis. The selection of these sources is determined by a simpler method for studying the interaction of plasma with a solid material surface. To refine the specified high-temperature mechanisms, thermodynamic modeling has been performed using the Astra software package.Примечания о наличии в документе библиографии/указателя: References: p. 62.Аудитория: .Тематика: труды учёных ТПУ
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References: p. 62

Modeling of high-temperature processes in oxide-silicate systems under the effect of plasma is performed. The research is implemented with plasma guns used in analytical chemistry for atom-emission analysis. The selection of these sources is determined by a simpler method for studying the interaction of plasma with a solid material surface. To refine the specified high-temperature mechanisms, thermodynamic modeling has been performed using the Astra software package

Оригинал на русском языке см.: Стекло и керамика. 2004. N 4. С. 25-28

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