Optical properties of GaAs films deposited via pulsed ion ablation / A. V. Kabyshev, F. V. Konusov, G. E. Remnev
Уровень набора: Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques, Scientific JournalЯзык: английский ; резюме, eng.Страна: Россия.Резюме или реферат: Optical reflectance and absorbance of gallium arsenide films formed on polycrystalline corundum, quartz glass, and copper foil are investigated in the energy interval of 1.1–6.2 eV. The films have been deposited from ablation plasma induced by a high-power ion beam. The exponential and interband absorbance spectra of the material of films are determined by defects in the GaAs crystalline lattice and the intricate composition of the material with predominance of nanocrystalline inclusions in the amorphous phase. Films deposited on polycor at the plasma flame center with the use of a low-resistance target have optimal properties for application in devices of optoelectronics and solar power engineering. Thermal vacuum treatment at 300–850 K modifies the optical properties of films owing to annealing of defects and changing of the structural-phase composition of a material..Примечания о наличии в документе библиографии/указателя: [Ref.: p.235 (35 tit.)].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ Ресурсы он-лайн:Щелкните здесь для доступа в онлайнTitle screen
[Ref.: p.235 (35 tit.)]
Optical reflectance and absorbance of gallium arsenide films formed on polycrystalline corundum, quartz glass, and copper foil are investigated in the energy interval of 1.1–6.2 eV. The films have been deposited from ablation plasma induced by a high-power ion beam. The exponential and interband absorbance spectra of the material of films are determined by defects in the GaAs crystalline lattice and the intricate composition of the material with predominance of nanocrystalline inclusions in the amorphous phase. Films deposited on polycor at the plasma flame center with the use of a low-resistance target have optimal properties for application in devices of optoelectronics and solar power engineering. Thermal vacuum treatment at 300–850 K modifies the optical properties of films owing to annealing of defects and changing of the structural-phase composition of a material.
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