Ion trajectories calculation for negatively biased needle cathode in volume discharge plasma / A. G. Remnev [et al.]

Уровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesАльтернативный автор-лицо: Remnev, A. G.;Uemura, K.;Kozyrev, A. V.;Lopatin, V. V., Doctor of physical and mathematical sciences, Professor of Tomsk Polytechnic University (TPU), 1947-, Vladimir VasilyevichКоллективный автор (вторичный): Национальный исследовательский Томский политехнический университет (ТПУ), Институт физики высоких технологий (ИФВТ), Кафедра техники и электрофизики высоких напряжений (ТЭВН)Язык: английский.Резюме или реферат: Ion trajectories were simulated for the case of multi-needle negatively biased electrode immerged into the volume type plasma. The model was simplified to the 2d case with planar plasma boundary. The electrical field distribution was calculated with the FEA method. Resulting piece wise function was then used to predict ion trajectories emitted from the plasma sheath boundary. Series of the ion trajectories were simulated for different plasma and accelerating gap parameters using single particle analysis. Distribution of the ion current density along the needle surface and angles of the ion incidence were obtained from the simulation. Experimental and theoretical etching profiles are consistent..Примечания о наличии в документе библиографии/указателя: [References: 5 tit.].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | траектории | ионы | катоды | плазма | ионный ток | электрическое поле Ресурсы он-лайн:Щелкните здесь для доступа в онлайн
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[References: 5 tit.]

Ion trajectories were simulated for the case of multi-needle negatively biased electrode immerged into the volume type plasma. The model was simplified to the 2d case with planar plasma boundary. The electrical field distribution was calculated with the FEA method. Resulting piece wise function was then used to predict ion trajectories emitted from the plasma sheath boundary. Series of the ion trajectories were simulated for different plasma and accelerating gap parameters using single particle analysis. Distribution of the ion current density along the needle surface and angles of the ion incidence were obtained from the simulation. Experimental and theoretical etching profiles are consistent.

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