Title screen

[References: 14 tit.]

The aim of this study was to prevent the problems associated with implants failure. Biocompatible nanostructured thin films of either Si- or Ag-containing non-stoichiometric hydroxyapatite (HA) were deposited by method of radio-frequency (rf) magnetron sputtering. Plates of Ti, Ti6Al4V and 316 L SS were used as substrates. The thin coatings were characterized by EDX, ESEM, XRD, IR spectroscopy, HRTEM, nanoindentation and scratch-test. HRTEM observations of the coatings showed a nanocrystalline structure mixed with amorphous regions. It was found that the morphology, structure and the preferred orientation of the films are greatly affected by the parameters of deposition (rf-power, substrate temperature and voltage bias). The as-deposited modified CaP-based coatings are dense, pore-free and their composition resembles that of the precursor target composition. The Si- and Ag- containing HA coatings had a hardness of 10-12 GPa. A low rf-power (30 W) resulted in amorphous or low crystalline CaP coating structure. An increase in rf-power (>; 200 W) induced the coating crystallization. The occurrence of the different structure types is described as function of the bias voltage and temperatures. The negative substrate bias allowed to vary the Ca/P ratio in the range of 1.53 to 4. In vitro biocompatibility assessments of the films using the MG63 osteoblast-like cells indicated excellent cell adherence and surface colonization. Si-containing rf-magnetron films promote osteogenic differentiation of human stromal stem cells in vitro. The coatings are prospective to be used in clinical practice: in stomatology or craniofacial medicine, where the leaching of toxic ions from the substrate is necessary or the initial material surface porosity for a further bone in growth should be preserved.