Interaction of Al2O3 thin films deposited on nanocrystalline titanium with hydrogen / N. N. Nikitenkov [et al.]
Уровень набора: Thin Solid Films = 1967-Язык: английский.Страна: .Резюме или реферат: The aim of the present study is to investigate hydrogen permeation through an aluminium oxide coating Al2O3,which was deposited on the nanocrystalline titanium (NCTi) using two methods: deposition from a substrate saturatedwith hydrogen, and saturation of Al2O3/NCTi system from an ambient medium (electrolyte, gas, plasma).Films were deposited onto the surface of specimens by magnetron sputtering. While performing the deposition,hydrogen diffused throughout the depth of the film; however, diffusion was restricted to the area near the film–substrate interface, affecting less than 50% of the thickness of the film. Film–substrate interface is significantlybroader (compared to the deposition on an unsaturated substrate), and metallic hydroxides are formed in theinterface. Saturation of Al2O3/NC Ti system with hydrogen was performed using three methods: electrolyticmethod, saturation from the high-frequency discharge hydrogen plasma, and from hydrogen atmosphere athigh temperature and pressure. The analysis of the saturation process shows that the Al2O3 coating can protectthe metal surface from hydrogen permeation only in the case of its operation in the conditions of contact withaqueous solutions..Примечания о наличии в документе библиографии/указателя: [References: p. 173 (21 tit.)].Аудитория: .Тематика: электронный ресурс | films | nanocrystalline titanium | hydrogen | magnetron sputtering | layers | spectroscopy Ресурсы он-лайн:Щелкните здесь для доступа в онлайнTitle screen
[References: p. 173 (21 tit.)]
The aim of the present study is to investigate hydrogen permeation through an aluminium oxide coating Al2O3,which was deposited on the nanocrystalline titanium (NCTi) using two methods: deposition from a substrate saturatedwith hydrogen, and saturation of Al2O3/NCTi system from an ambient medium (electrolyte, gas, plasma).Films were deposited onto the surface of specimens by magnetron sputtering. While performing the deposition,hydrogen diffused throughout the depth of the film; however, diffusion was restricted to the area near the film–substrate interface, affecting less than 50% of the thickness of the film. Film–substrate interface is significantlybroader (compared to the deposition on an unsaturated substrate), and metallic hydroxides are formed in theinterface. Saturation of Al2O3/NC Ti system with hydrogen was performed using three methods: electrolyticmethod, saturation from the high-frequency discharge hydrogen plasma, and from hydrogen atmosphere athigh temperature and pressure. The analysis of the saturation process shows that the Al2O3 coating can protectthe metal surface from hydrogen permeation only in the case of its operation in the conditions of contact withaqueous solutions.
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