Measurements of parametric X-rays from relativistic electrons in silicon crystals / Yu. N. Adishchev [et al.]
Уровень набора: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, Scientific Journal = 1984-Язык: английский.Резюме или реферат: Spectral and angular distributions of parametric X-rays have been measured for (200-900) MeV electrons from Si single crystal. The parametric X-rays were observed at an angle θ = 19° relative to the beam of electrons, which intersects the (110) or (111) Si crystallographic planes. The energetic dependence of the PX intensity was also obtained..Примечания о наличии в документе библиографии/указателя: [References: p. 55 (19 tit.)].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ Ресурсы он-лайн:Щелкните здесь для доступа в онлайнНет реальных экземпляров для этой записи
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[References: p. 55 (19 tit.)]
Spectral and angular distributions of parametric X-rays have been measured for (200-900) MeV electrons from Si single crystal. The parametric X-rays were observed at an angle θ = 19° relative to the beam of electrons, which intersects the (110) or (111) Si crystallographic planes. The energetic dependence of the PX intensity was also obtained.
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