Influence of Surface Modification of Nitinol with Silicon Using Plasma-Immersion Ion Implantation on the Alloy Corrosion Resistance in Artificial Physiological Solutions / O. A. Kashin [et al.]
Уровень набора: (RuTPU)RU\TPU\network\4816, AIP Conference ProceedingsЯзык: английский.Резюме или реферат: Cyclic voltammetry and potentiostatic polarization have been applied to study electrochemical behavior and to determine corrosion resistance of nitinol, which surface was modified with silicon using plasma-immersion ion implantation, in 0.9% NaCl solution and in artificial blood plasma. It was found out that continuous, and also homogeneous in composition, thin Si-containing layers are resistant to corrosion damage at high positive potentials in artificial physiological solutions due to formation of stable passive films. Breakdown potential Eb of Si-modified NiTi depends on the character of silicon and Ni distribution at the alloy surface, E[b] values amounted to 0.9-1.5 V (Ag/AgCl/KCl sat.) for the alloy samples with continuous Si-containing surface layers and with decreased Ni surface concentration..Примечания о наличии в документе библиографии/указателя: [References: 6 tit.].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | модификация | поверхности | кремний | ионная имплантация | сплавы | физиологические растворы | коррозионная стойкость | поверхностные слои Ресурсы он-лайн:Щелкните здесь для доступа в онлайнTitle screen
[References: 6 tit.]
Cyclic voltammetry and potentiostatic polarization have been applied to study electrochemical behavior and to determine corrosion resistance of nitinol, which surface was modified with silicon using plasma-immersion ion implantation, in 0.9% NaCl solution and in artificial blood plasma. It was found out that continuous, and also homogeneous in composition, thin Si-containing layers are resistant to corrosion damage at high positive potentials in artificial physiological solutions due to formation of stable passive films. Breakdown potential Eb of Si-modified NiTi depends on the character of silicon and Ni distribution at the alloy surface, E[b] values amounted to 0.9-1.5 V (Ag/AgCl/KCl sat.) for the alloy samples with continuous Si-containing surface layers and with decreased Ni surface concentration.
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