The Forming of Model Colloid System / D. A. Voyno, K. I. Machekhina, L. N. Shiyan

Уровень набора: (RuTPU)RU\TPU\network\4598, Advanced Materials Research, Scientific JournalОсновной Автор-лицо: Voyno, D. A., Denis AleksandrovichАльтернативный автор-лицо: Machekhina, K. I., Chemical Engineer, engineer-researcher of Tomsk Polytechnic University, candidate of technical Sciences, 1987-, Ksenia Igorevna;Shiyan, L. N., chemist, Associate Professor of Tomsk Polytechnic University, Candidate of physical and mathematical sciences, 1952-, Lyudmila NikolaevnaКоллективный автор (вторичный): Национальный исследовательский Томский политехнический университет (ТПУ), Институт физики высоких технологий (ИФВТ), Кафедра общей химии и химической технологии (ОХХТ)Язык: английский.Серия: Materials Science and Chemical EngineeringРезюме или реферат: The paper reports on the creation of a model colloid test system which is similar to groundwater and it can be used as a test system in the water treatment. It is found that at the molar ratio iron/silicon/organic substance is equal to1/7/2 and two orders such as organic substances-Si-Fe and Si-organic substances-Fe, stable colloid system is formed. The mechanism of formation of iron colloid system is described by three steps. The first is the formation of the organosilicon complexes. The second is oxidation of the iron and forming of Fe (OH)3. The last is forming a sol at zeta potential is - 35 mV with electrostatic interaction..Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | коллоидные растворы | железо | органические вещества Ресурсы он-лайн:Щелкните здесь для доступа в онлайн
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The paper reports on the creation of a model colloid test system which is similar to groundwater and it can be used as a test system in the water treatment. It is found that at the molar ratio iron/silicon/organic substance is equal to1/7/2 and two orders such as organic substances-Si-Fe and Si-organic substances-Fe, stable colloid system is formed. The mechanism of formation of iron colloid system is described by three steps. The first is the formation of the organosilicon complexes. The second is oxidation of the iron and forming of Fe (OH)3. The last is forming a sol at zeta potential is - 35 mV with electrostatic interaction.

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