Effect of bias potential on the structure and distribution of elements in titanium-nitride coatings obtained by cathodic-arc deposition / E. B. Kashkarov [et al.]
Уровень набора: Journal of Surface Investigation. X-ray, Synchrotron and Neutron TechniquesЯзык: английский.Резюме или реферат: It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma..Примечания о наличии в документе библиографии/указателя: [References: p. 651 (11 tit.)].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | нитрид титана | потенциал смещения | титановые покрытия Ресурсы он-лайн:Щелкните здесь для доступа в онлайнНет реальных экземпляров для этой записи
Title screen
[References: p. 651 (11 tit.)]
It is shown that a change in the pulsed bias potential in the process of the cathodic-arc deposition of titanium nitride has a significant effect on the structure and composition of coatings, as well as on the quantity of the microdroplet fraction. A bias potential of above 50 V leads to a decrease in the coating growth rate, which is related to resputtering of the coating by ions accelerated from the plasma.
Для данного заглавия нет комментариев.
Личный кабинет оставить комментарий.