Influence of Repetitively Pulsed Negative Bias Parameters on Macroparticle Surface Density / A. I. Ryabchikov [et al.]

Уровень набора: Journal of Industrial Pollution ControlАльтернативный автор-лицо: Ryabchikov, A. I., Professor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences, physicist, 1950-, Aleksandr Ilyich;Sivin, D. O., physicist, Senior researcher of Tomsk Polytechnic University, Candidate of technical sciences, 1978-, Denis Olegovich;Bumagina, A. I., physicist, Associate Scientist of Tomsk Polytechnic University, 1987-, Anna Ivanovna;Shevelev, A. E., Physicist, Engineer of Tomsk Polytechnic University, 1990-, Aleksey Eduardovich;Shulepov, I. A., physicist, Engineer-designer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences, 1954-, Ivan Anisimovich;Ananin, P. S., physicist, senior researcher of Tomsk Polytechnic University, candidate of physical and mathematical sciences, 1942-, Petr SemenovichКоллективный автор (вторичный): Национальный исследовательский Томский политехнический университет (ТПУ), Физико-технический институт (ФТИ), Лаборатория № 22Язык: английский.Страна: .Резюме или реферат: The results of an experimental study of the influence of a substrate negative bias with various pulse widths and pulse repetition rates ranging from several Hz to 105 Hz on the macroparticle (MP) accumulation on substrate immersed in a DC titanium vacuum arc plasma are presented. It was found that the rate of MP deposition on the substrate surface depends significantly on the bias pulse parameters and the processing time. The influence of the multiple recharging of MPs in the plasma and the sheath on the reflection of these MPs in a sheath electric field is discussed..Примечания о наличии в документе библиографии/указателя: [References: p 470-471 (21 tit.)].Тематика: электронный ресурс | труды учёных ТПУ | substrate negative bias | macroparticle accumulation | microdroplets | vacuum arc plasma | gaseous plasma | микрокапли | вакуумно-дуговая плазма | газовая плазма | подложки | отрицательное смещение Ресурсы он-лайн:Щелкните здесь для доступа в онлайн
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[References: p 470-471 (21 tit.)]

The results of an experimental study of the influence of a substrate negative bias with various pulse widths and pulse repetition rates ranging from several Hz to 105 Hz on the macroparticle (MP) accumulation on substrate immersed in a DC titanium vacuum arc plasma are presented. It was found that the rate of MP deposition on the substrate surface depends significantly on the bias pulse parameters and the processing time. The influence of the multiple recharging of MPs in the plasma and the sheath on the reflection of these MPs in a sheath electric field is discussed.

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