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[References: 40 tit.]

Ultrananocrystalline diamond films are synthesized on Si substrate by HFCVD method with a high methane concentration (up to 23.1 vol%) in the gas mixture. The morphology and structural properties of the grown diamond films are analyzed using scanning electron microscope (SEM), atomic force microscope (AFM), X-ray diffraction and Raman spectroscopy. It is shown that the surface roughness, crystallite size, hardness and friction coefficient of the obtained films decrease with increasing methane content in the gas mixture. The relationship between the CoF and the wear rate of diamond films is also analyzed. It is found that by reducing the CoF from 0.11 to 0.067, wear rate of the obtained films increases from 0.08 to 7.11 × 10−10 m3 N−1 m−1.