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[References: 9 tit.]

The development of methods to modify materials based on the synergy of high-intensity implantation and simultaneous energy exposure is intended at creating deep ion-doped layers. For this purpose, it is proposed to use pulsed and repetitively-pulsed beams of metal and gas ions with microsubmillisecond duration with a high-pulsed power density. The paper presents the results of numerical simulation of the pulsed and repetitively-pulsed high-intensity ion beam formation. Simulations were performed using the Karat code. The ballistic focusing of heavy ions was studied at injection current from 0.1 to 1 A. The influence of the ion current density, accelerating voltage, ion charge composition, and conditions for neutralizing the beam space charge on the high-power ion beam transport and focusing has been studied. The conditions for the virtual anode appearance have been determined and studied. It has been found that for long durations of ion beam formation at low pressures of the residual atmosphere, multiple appearance and disappearance of a virtual anode is possible. The possibility of ballistic formation of ion beams with a pulse density of hundreds of kilowatts per square centimeter is shown.