TY  - ELEC
AU  - Gricenko (Gritsenko), B. P.
AU  - Bespalov, V. V.
TI  - A Cathode Unit for High-Dose Implantation of Semiconductor Materials
T2  - Beam and plasma sources
KW  - ÑÐ¸Ð·Ð¸ÐºÐ°
KW  - Ð¿Ð»Ð°Ð·Ð¼Ð°
KW  - Ð¿Ð¾Ð»ÑÐ¿ÑÐ¾Ð²Ð¾Ð´Ð½Ð¸ÐºÐ¾Ð²ÑÐµ Ð¼Ð°ÑÐµÑÐ¸Ð°Ð»Ñ
KW  - ÐºÐ°ÑÐ¾Ð´Ð½ÑÐµ ÑÐ·Ð»Ñ
KW  - Ð¸Ð¾Ð½Ð½ÑÐµ Ð¸ÑÑÐ¾ÑÐ½Ð¸ÐºÐ¸
KW  - Ð²ÑÑÐ¾ÐºÐ¾Ð´Ð¾Ð·Ð½Ð°Ñ Ð¸Ð¼Ð¿Ð»Ð°Ð½ÑÐ°ÑÐ¸Ñ
KW  - ÐºÐ°ÑÐ¾Ð´Ð½ÑÐµ Ð¼Ð°ÑÐµÑÐ¸Ð°Ð»Ñ
KW  - ÑÑÑÐ´Ñ ÑÑÑÐ½ÑÑ Ð¢ÐÐ£
KW  - ÑÐ»ÐµÐºÑÑÐ¾Ð½Ð½ÑÐ¹ ÑÐµÑÑÑÑ
N2  - [References: p. 50 (4 tit.)]
UR  - http://www.lib.tpu.ru/fulltext2/c/2004/C13/033.pdf
ER  -