000 01674nam1a2200301 4500
001 596125
005 20231030033650.0
035 _a(RuTPU)RU\TPU\tpu\18175
035 _aRU\TPU\tpu\18170
090 _a596125
100 _a20100928a2004 k y0engy50 ba
101 1 _aeng
102 _aUS
200 1 _aModeling Processes in Oxide-Silicate Systems Treated by Plasma for the Purpose of Improving Coating Quality
_fV. I. Otmakhov [et al.]
320 _aReferences: p. 62
330 _aModeling of high-temperature processes in oxide-silicate systems under the effect of plasma is performed. The research is implemented with plasma guns used in analytical chemistry for atom-emission analysis. The selection of these sources is determined by a simpler method for studying the interaction of plasma with a solid material surface. To refine the specified high-temperature mechanisms, thermodynamic modeling has been performed using the Astra software package
333 _aВ фонде НТБ ТПУ отсутствует
390 _aОригинал на русском языке см.: Стекло и керамика. 2004. N 4. С. 25-28
461 _tGlass and Ceramics
_d2004
463 _tVol. 61 N 1-2
_vP. 59-62
_d2004
610 1 _aтруды учёных ТПУ
701 1 _aOtmakhov
_bV. I.
701 1 _aVereshchagin
_bV. I.
_cRussian scientist of chemical engineering
_cProfessor of silicates technology of Tomsk Polytechnic University
_f1942-
_gVladimir Ivanovich
_xTPU
_2stltpush
_3(RuTPU)RU\TPU\pers\26325
701 1 _aMokrousov
_bG. M.
701 1 _aAbakumova
_bE. P.
801 1 _aRU
_b63413507
_c20100524
801 2 _aRU
_b63413507
_c20120523
_gRCR
942 _cBK