| 000 | 01995nam1a2200277 4500 | ||
|---|---|---|---|
| 001 | 597220 | ||
| 005 | 20231030033722.0 | ||
| 035 | _a(RuTPU)RU\TPU\tpu\20407 | ||
| 035 | _aRU\TPU\tpu\20406 | ||
| 090 | _a597220 | ||
| 100 | _a20111216d2007 k |0engy50 ba | ||
| 101 | 1 | _aeng | |
| 102 | _aNL | ||
| 200 | 1 |
_aHigh-Frequensy Short-Pulsed Metal Plasma-Immersion Ion Implantion Or Deposition Using Filtered DC Vacuum-ARC Plasma _fA. I. Ryabchikov [et al.] |
|
| 330 | _aA new approach to the development of advanced coating deposition and ion implantation method including an application of filtered dc metal plasma and high-frequency short-pulsed negative bias voltage with a duty factor in the range of 10-99% are considered. The ion energy spectrum for different negative bias potential pulse durations (120-1100ns) was measured. The chart of various methods of ion beam and plasma material treatment using high-frequency short pulse metal plasma immersion ion implantation or deposition depending on bias pulse duty factor and amplitude for Cu plasma is presented. The ion assisted coating deposition has been examined depending on samples conductivity and thickness, plasma concentration, pulse repetition rate, amplitude, and duty factor. | ||
| 333 | _aВ фонде НТБ ТПУ отсутствует | ||
| 461 |
_tSurface and Coatings Technology _d2004- |
||
| 463 |
_tVol. 201, № 15 _vP. 6523-6525 _d2007 |
||
| 610 | 1 | _aтруды учёных ТПУ | |
| 701 | 1 |
_aRyabchikov _bA. I. _cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences _cphysicist _f1950- _gAleksandr Ilyich _xTPU _2stltpush _3(RuTPU)RU\TPU\pers\30912 |
|
| 701 | 1 |
_aRyabchikov _bI. A. |
|
| 701 | 1 |
_aStepanov _bI. B. |
|
| 701 | 1 |
_aUsov _bY. P. _cProfessor of Tomsk Polytechnic University, Electrical engineer, Doctor of Technical Sciences _f1937- _gYuri Petrovich _xTPU _2stltpush _3(RuTPU)RU\TPU\pers\28977 |
|
| 801 | 0 |
_aRU _b63413507 _c20011210 _gPSBO |
|
| 801 | 2 |
_aRU _b63413507 _c20131010 _gPSBO |
|
| 942 | _cBK | ||