| 000 | 01924nam1a2200277 4500 | ||
|---|---|---|---|
| 001 | 602481 | ||
| 005 | 20231030033957.0 | ||
| 035 | _a(RuTPU)RU\TPU\tpu\28348 | ||
| 035 | _aRU\TPU\tpu\28347 | ||
| 090 | _a602481 | ||
| 100 | _a20160427a2013 k y0rusy50 ca | ||
| 101 | 0 | _arus | |
| 102 | _aRU | ||
| 200 | 1 |
_aPlasma generation in a low-pressure hollow-cathode non-self-sustained glow discharge _fI. V. Lopatin [et al.] |
|
| 330 | _aResearch on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 1011 cm−3 at 15-A currents. Nitriding in the discharge plasma at 600°C for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 µm. | ||
| 333 | _aВ фонде НТБ ТПУ отсутствует | ||
| 461 | _tHigh Temperature Material Processes: An International Quarterly of High-Technology Plasma Processes | ||
| 463 |
_tVol. 17, № 2-3 _vP. 117-125 _d2013 |
||
| 610 | 1 | _aтруды учёных ТПУ | |
| 701 | 1 |
_aLopatin _bI. V. |
|
| 701 | 1 |
_aAkhmadeev _bY. K. |
|
| 701 | 1 |
_aKoval _bN. N. _cspecialist in the field of electronics _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1948- _gNikolay Nikolaevich _xTPU _2stltpush _3(RuTPU)RU\TPU\pers\34748 |
|
| 701 | 1 |
_aSchanin _bP. M. |
|
| 801 | 1 |
_aRU _b63413507 _c20160427 |
|
| 801 | 2 |
_aRU _b63413507 _c20160427 _gRCR |
|
| 942 | _cBK | ||