000 01698nam1a2200277 4500
001 602544
005 20231030033959.0
035 _a(RuTPU)RU\TPU\tpu\28440
035 _aRU\TPU\tpu\19667
090 _a602544
100 _a20160609d1996 k y0engy50 ba
101 0 _aeng
102 _aUS
200 1 _aNanosecond high current and high repetition rate electron source
_fV. I. Gushenets [et al.]
330 _aA broad electron beam source with a plasma hollow cathode has been developed which is intended for production of nanosecond electron beams with a high repetition rate. The source lifetime is over 109 shots. To reduce the operating pressure and shorten the time required for the formation of plasma in the cathode cavity, an auxiliary triggering glow discharge with a hollow cathode is used. With an accelerating voltage of 40 kV a pulse repetition rate of 50-1000 Hz, and a pulse duration of 100 ns, an electron beam of current up to 200 A and risetime 25 ns has been produced.
333 _aВ фонде НТБ ТПУ отсутствует
461 _tProceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996
_d1996
463 _tVol. 27, № 4
_vP. 1055-1059
_d1996
610 1 _aтруды учёных ТПУ
701 1 _aGushenets
_bV. I.
701 1 _aKoval
_bN. N.
_cspecialist in the field of electronics
_cProfessor of Tomsk Polytechnic University, Doctor of technical sciences
_f1948-
_gNikolay Nikolaevich
_xTPU
_2stltpush
_3(RuTPU)RU\TPU\pers\34748
701 1 _aSchanin
_bP. M.
701 1 _aTolkachev
_bV. S.
801 1 _aRU
_b63413507
_c20110808
801 2 _aRU
_b63413507
_c20160609
_gRCR
942 _cBK