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001 602545
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035 _a(RuTPU)RU\TPU\tpu\28441
035 _aRU\TPU\tpu\28440
090 _a602545
100 _a20160609d1996 k y0engy50 ba
101 0 _aeng
102 _aUS
200 1 _aNonmonotonic potential distribution and current quenching mechanism in plasma-filled diode
_fN. P. Kondrat'eva [et al.]
330 _aThe phenomenon of current quenching in a plasma filled diode forms the basis for operation of the so called plasma erosion opening switch. In typical operation conditions of the switch, a vacuum gap is preliminarily filled with a plasma from an external source after which a voltage is applied to the gap and an external electric circuit provides for a current rise with a characteristic time of the order of 1 ?s. When the current reaches some critical value the resistance of the gap sharply increases so that the current quenching and the corresponding voltage kick occurs, i.e. the gap opens for a short time. A widely used approach for interpretation of the current quenching mechanism is based on the supposition that the gap conductivity is totally determined by the plasma generated by external source. In our opinion, this viewpoint is not exactly correct, especially for the microsecond time scale, and the current passage mechanism is mainly determined by the cathode spot plasma. A foundation of this approach is presented in this paper.
333 _aВ фонде НТБ ТПУ отсутствует
461 _tProceedings of the 17th International Symposium on Discharges and Electrical Insulation in Vacuum, ISDEIV, Berkeley, CA, july 21-26, 1996
_d1996
463 _tVol. 2
_vP. 684-687
_d1996
610 1 _aтруды учёных ТПУ
701 1 _aKondrat'eva
_bN. P.
701 1 _aKorolev
_bY. D.
701 1 _aKoval
_bN. N.
_cspecialist in the field of electronics
_cProfessor of Tomsk Polytechnic University, Doctor of technical sciences
_f1948-
_gNikolay Nikolaevich
_xTPU
_2stltpush
_3(RuTPU)RU\TPU\pers\34748
701 1 _aRabotkin
_bV. G.
701 1 _aSchanin
_bP. M.
701 1 _aShemyakin
_bI. A.
801 1 _aRU
_b63413507
_c20110808
801 2 _aRU
_b63413507
_c20160609
_gRCR
942 _cBK