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100 _a20151203a2014 k y0engy50 ba
101 0 _aeng
102 _aGB
135 _adrcn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aLangmuir probe measurement of the bismuth plasma plume formed by an extreme-ultraviolet pulsed laser
_fP. Pira, T. Burian, A. Kolpakova [et al.]
203 _aText
_celectronic
300 _aTitle screen
330 _aProperties of the plasma plume produced on a bismuth (Bi) target irradiated by a focused extreme-ultraviolet (XUV) capillary-discharge laser beam were investigated. Langmuir probes were used in both single- and double-probe arrangements to determine the electron temperature and the electron density, providing values of 1–3 eV and ~1013–1014 m?3, respectively. Although the temperatures seem to be comparable with values obtained in ablation plasmas produced by conventional, long-wavelength lasers, the density is significantly lower. This finding indicates that the desorption-like phenomena are responsible for the plume formation rather than the ablation processes. A very thin Bi film was prepared on an MgO substrate by pulsed XUV laser deposition. The non-uniform, sub-monolayer character of the deposited bismuth film confirms the Langmuir probe's observation of the desorption-like erosion induced by the XUV laser on the primary Bi target.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 _tJournal of Physics D: Applied Physics
_d1968-
463 _tVol. 47, iss. 40
_v[405205]
_d2014
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
701 1 _aPira
_bP.
701 1 _aBurian
_bT.
701 1 _aKolpakova
_bA.
701 1 _aTichy
_bM.
_cchemist
_cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences
_f1947-
_gMilan
_2stltpush
_3(RuTPU)RU\TPU\pers\35771
701 1 _aKudrna
_bP.
701 1 _aDanis
_bS.
701 1 _aJuha
_bL.
701 1 _aLancok
_bJ.
701 1 _aVysin
_bL.
701 1 _aCivis
_bS.
701 1 _aZelinger
_bZ.
701 1 _aKubat
_bP.
701 1 _aWild
_bJ.
712 0 2 _aНациональный исследовательский Томский политехнический университет (ТПУ)
_bФизико-технический институт (ФТИ)
_bКафедра технической физики (№ 23) (ТФ)
_h52
_2stltpush
_3(RuTPU)RU\TPU\col\18732
801 2 _aRU
_b63413507
_c20210616
_gRCR
856 4 _uhttp://dx.doi.org/10.1088/0022-3727/47/40/405205
942 _cCF