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005 20231030040748.0
035 _a(RuTPU)RU\TPU\network\12166
035 _aRU\TPU\network\12164
090 _a647029
100 _a20160323a2016 k y0engy50 ba
101 0 _aeng
105 _ay z 100zy
135 _adrgn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aCarbon saturation of silicon target under the action of pulsed high-intensity ion beam
_fN. E. Aktaev, G. E. Remnev
203 _aText
_celectronic
300 _aTitle screen
320 _a[References: 9 tit.]
330 _aThe action of the pulsed high-intensity ion (carbon) beam on the silicon target is investigated by means of the theoretical model. The forming of the carbon concentration profile in depth of the silicon sample is modelled. It is argued, that there are two ways of the profile forming: short-pulsed ion (carbon) implantation and diffusion of the carbon atoms adsorbed on the silicon surface. It is shown, that the carbon atoms adsorbed on the silicon surface and diffused into the silicon target play the main role in the concentration profile forming.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 0 _0(RuTPU)RU\TPU\network\2008
_tIOP Conference Series: Materials Science and Engineering
463 0 _0(RuTPU)RU\TPU\network\11965
_tVol. 110 : Radiation-Thermal Effects and Processes in Inorganic Materials (RTEP2015)
_oInternational Scientific Conference, 31 August to 10 September 2015, Tomsk, Russia
_o[proceedings]
_v[012054, 9 p.]
_d2016
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
610 1 _aнасыщение
610 1 _aуглерод
610 1 _aкремниевые мишени
610 1 _aимпульсные пучки
610 1 _aионные пучки
610 1 _aкремний
610 1 _aповерхности
700 1 _aAktaev
_bN. E.
_cphysicist
_cresearch engineer of Tomsk Polytechnic University, Candidate of physical and mathematical sciences
_f1985-
_gNurken Erbolatovich
_2stltpush
_3(RuTPU)RU\TPU\pers\33514
701 1 _aRemnev
_bG. E.
_cphysicist
_cProfessor of Tomsk Polytechnic University, Doctor of technical sciences
_f1948-
_gGennady Efimovich
_2stltpush
_3(RuTPU)RU\TPU\pers\31500
712 0 2 _aНациональный исследовательский Томский политехнический университет (ТПУ)
_bИнститут физики высоких технологий (ИФВТ)
_bЛаборатория № 1
_h6378
_2stltpush
_3(RuTPU)RU\TPU\col\19035
801 2 _aRU
_b63413507
_c20161121
_gRCR
856 4 _uhttp://dx.doi.org/10.1088/1757-899X/110/1/012054
856 4 0 _uhttp://earchive.tpu.ru/handle/11683/18076
942 _cCF