| 000 | 04122nla2a2200517 4500 | ||
|---|---|---|---|
| 001 | 648620 | ||
| 005 | 20231030040844.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\13779 | ||
| 035 | _aRU\TPU\network\13778 | ||
| 090 | _a648620 | ||
| 100 | _a20160526a2016 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 102 | _aGB | ||
| 105 | _ay z 100zy | ||
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aRadiation-induced deposition of transparent conductive tin oxide coatings _fS. P. Umnov, O. Kh. Asainov, V. Temenkov |
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| 203 |
_aText _celectronic |
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| 225 | 1 | _aMaterials Science in Mechanical Engineering | |
| 300 | _aTitle screen | ||
| 320 | _a[References: 12 tit.] | ||
| 330 | _aThe study of tin oxide films is stimulated by the search for an alternative replacement of indium-tin oxide (ITO) films used as transparent conductors, oxidation catalysts, material gas sensors, etc. This work was aimed at studying the influence of argon ions irradiation on optical and electrical characteristics of tin oxide films. Thin films of tin oxide (without dopants) were deposited on glass substrates at room temperature using reactive magnetron sputtering. After deposition, the films were irradiated with an argon ion beam. The current density of the beam was (were) 2.5 mA/cm{2}, and the particles energy was 300-400 eV. The change of the optical and electrical properties of the films depending on the irradiation time was studied. Films optical properties were investigated by photometry in the range of 300-1100 nm. Films structural properties were studied using X-ray diffraction. The diffractometric research showed that the films, deposited on a substrate, had a crystal structure, and after argon ions irradiation they became quasi-crystalline (amorphous). It has been found that the transmission increases proportionally with the irradiation time, however the sheet resistance increases disproportionally. Tin oxide films (thickness ~30 nm) with ~100% transmittance and sheet resistance of ~100 kOhm/sq. were obtained. The study has proved to be prospective in the use of ion beams to improve the properties of transparent conducting oxides. | ||
| 461 | 0 |
_0(RuTPU)RU\TPU\network\2008 _tIOP Conference Series: Materials Science and Engineering |
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| 463 | 0 |
_0(RuTPU)RU\TPU\network\13617 _tVol. 124 : Mechanical Engineering, Automation and Control Systems (MEACS2015) _oInternational Conference, 1–4 December 2015, Tomsk, Russia _o[proceedings] _v[012148, 5 p.] _d2016 |
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| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _aрадиационно-стимулированное осаждение | |
| 610 | 1 | _aпрозрачные покрытия | |
| 610 | 1 | _aоксид олова | |
| 610 | 1 | _aоптические характеристики | |
| 610 | 1 | _aэлектрические характеристики | |
| 610 | 1 | _aпленки | |
| 610 | 1 | _aмагнетронное распыление | |
| 610 | 1 | _aфотометрия | |
| 610 | 1 | _aионные пучки | |
| 610 | 1 | _aстеклянные подложки | |
| 610 | 1 | _aионы аргона | |
| 700 | 1 |
_aUmnov _bS. P. _cphysicist _cSenior researcher of Tomsk Polytechnic University, Candidate of physical and mathematical sciences _f1957- _gSergey Pavlovich _2stltpush _3(RuTPU)RU\TPU\pers\34215 |
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| 701 | 1 |
_aAsainov _bO. Kh. _cphysicist _cHead of the laboratory of Tomsk Polytechnic University, Candidate of physical and mathematical sciences _f1957- _gOleg Khaydarovich _2stltpush _3(RuTPU)RU\TPU\pers\34632 |
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| 701 | 1 |
_aTemenkov _bV. |
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| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет (ТПУ) _bФизико-технический институт (ФТИ) _bКафедра технической физики (№ 23) (ТФ) _bЛаборатория № 16 _h6468 _2stltpush _3(RuTPU)RU\TPU\col\19671 |
| 801 | 2 |
_aRU _b63413507 _c20161125 _gRCR |
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| 856 | 4 | _uhttp://dx.doi.org/10.1088/1757-899X/124/1/012148 | |
| 856 | 4 | _uhttp://earchive.tpu.ru/handle/11683/33894 | |
| 942 | _cCF | ||