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001 649088
005 20231030040859.0
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090 _a649088
100 _a20160620a2012 k y0engy50 ba
101 0 _aeng
105 _ay z 100zy
135 _adrcn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aNanocrystalline nitride coatings deposited by vacuum arc plasma-assisted method
_fO. V. Krysina [et al.]
203 _aText
_celectronic
300 _aTitle screen
320 _a[References: p. 6 (8 tit.)]
330 _aIn the given work, experiments on research of formation of titanium nitride doped with copper (≤12 at %) produced by plasma-assisted vacuum arc deposition by evaporation of sintered Ti-Cu cathodes were carried out. It was revealed that Ti-Cu-N coatings have high hardness (≈40 GPa), high elastic recovery (≥50%), low friction coefficient (˜≈0.2) and high adhesion to a substrate compared with typical TiN coatings. By methods of transmission electron microscopy of thin foils and x-ray diffraction, it was showed that the coating crystallites consist of d-TiN with the average crystallite size of 10-30 nm and the sheath of doping elements (copper) with thickness of 2-3 monolayers is formed around of TiN crystallites.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 1 _0(RuTPU)RU\TPU\network\3526
_tJournal of Physics: Conference Series
463 _tVol. 370 : 14th Latin American Workshop on Plasma Physics (LAWPP 2011), 20–25 November 2011, Mar del Plata, Argentina
_v[6 p.]
_d2012
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
610 1 _aдуговой разряд
610 1 _aисточники плазмы
610 1 _aпробой вакуума
610 1 _aлечение
701 1 _aKrysina
_bO. V.
701 1 _aKoval
_bN. N.
_cspecialist in the field of electronics
_cProfessor of Tomsk Polytechnic University, Doctor of technical sciences
_f1948-
_gNikolay Nikolaevich
_2stltpush
_3(RuTPU)RU\TPU\pers\34748
701 1 _aIvanov
_bYu. F.
_cphysicist
_cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences
_f1955-
_gYuriy Fedorovich
_2stltpush
_3(RuTPU)RU\TPU\pers\33559
701 1 _aTimchenko
_bN. A.
701 1 _aBaumbach
_bT.
701 1 _aDoyle
_bS.
701 1 _aSlobodskyy
_bT.
712 0 2 _aНациональный исследовательский Томский политехнический университет (ТПУ)
_c(2009- )
_2stltpush
_3(RuTPU)RU\TPU\col\15902
801 2 _aRU
_b63413507
_c20161020
_gRCR
856 4 _uhttp://dx.doi.org/10.1088/1742-6596/370/1/012021
942 _cCF