000 | 02282nlm1a2200421 4500 | ||
---|---|---|---|
001 | 649105 | ||
005 | 20231030040900.0 | ||
035 | _a(RuTPU)RU\TPU\network\14266 | ||
035 | _aRU\TPU\network\14265 | ||
090 | _a649105 | ||
100 | _a20160620a2012 k y0engy50 ba | ||
101 | 0 | _aeng | |
135 | _adrcn ---uucaa | ||
181 | 0 | _ai | |
182 | 0 | _ab | |
200 | 1 |
_aInfluence of the composition of a plasma-forming gas on nitriding in a non-self-maintained glow discharge with a large hollow cathode _fN. N. Koval [et al.] |
|
203 |
_aText _celectronic |
||
300 | _aTitle screen | ||
320 | _a[References: p. 158 (8 tit.] | ||
330 | _aThe article presents the results of an investigation into the influence of the composition of a plasma-forming gas (N2, Ar, He) on nitriding of VT1-0 grade titanium (0.25%-Fe; 0.1%-Si; 0.2%-O) and commercial 40X steel (0.4%-C; 1.0%-Cr) in the plasma of a non-self-maintained glow discharge with a large hollow cathode. It is shown that the efficiency of nitriding of 40X steel weakly depends on the composition of the plasma-forming gas mixture, whereas nitriding of VT1-0 titanium in a helium-nitrogen mixture leads to a noticeable increase in the microhardness of the specimen’s surface in comparison with nitriding in an argon-nitrogen gas mixture. | ||
333 | _aРежим доступа: по договору с организацией-держателем ресурса | ||
461 |
_tJournal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques _d2007- |
||
463 |
_tVol. 6, № 1 _v[P. 54-158] _d2012 |
||
610 | 1 | _aэлектронный ресурс | |
610 | 1 | _aтруды учёных ТПУ | |
610 | 1 | _aстуктура | |
610 | 1 | _aфазовый состав | |
610 | 1 | _aхром-кремний | |
701 | 1 |
_aKoval _bN. N. _cspecialist in the field of electronics _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1948- _gNikolay Nikolaevich _2stltpush _3(RuTPU)RU\TPU\pers\34748 |
|
701 | 1 |
_aSchanin _bP. M. |
|
701 | 1 |
_aAkhmadeev _bY. K. |
|
701 | 1 |
_aLopatin _bI. V. |
|
701 | 1 |
_aKolobov _bY. R. |
|
701 | 1 |
_aVershinin _bD. S. |
|
701 | 1 |
_aSmolyakova _bM. Y. |
|
801 | 2 |
_aRU _b63413507 _c20210628 _gRCR |
|
856 | 4 | _uhttp://dx.doi.org/10.1134/S1027451012020115 | |
942 | _cCF |