000 | 02320nlm1a2200385 4500 | ||
---|---|---|---|
001 | 649109 | ||
005 | 20231030040900.0 | ||
035 | _a(RuTPU)RU\TPU\network\14270 | ||
035 | _aRU\TPU\network\14268 | ||
090 | _a649109 | ||
100 | _a20160621a2011 k y0engy50 ba | ||
101 | 0 | _aeng | |
135 | _adrcn ---uucaa | ||
181 | 0 | _ai | |
182 | 0 | _ab | |
200 | 1 |
_aA plasma generator based on nonself-sustained low-pressure glow discharge with a large-volume hollow cathode _fI. V. Lopatin [et al.] |
|
203 |
_aText _celectronic |
||
300 | _aTitle screen | ||
320 | _a[References: p. 146 (13 tit.)] | ||
330 | _aThe results of studying nonself-sustained glow discharges in an electrode system with a hollow cathode with a volume of 0.25 m3 are presented. A high-current (up to 35 A) nonself-sustained glow discharge at low pressures (0.3–1.0 Pa) is initiated and sustained with the help of an auxiliary cold-hollow-cathode arc discharge. When the current of a nonself-sustained glow discharge increases from 2 to 35 A, its burning voltage changes from 40 to 300 V. These values are much lower than the voltage for a self-sustained glow discharge in the same electrode system. At a discharge current of 30 A, the electron concentration at the center of the hollow cathode is n e ~ 1010–1011 cm-3 and the electron temperature is T e 2 eV. The discharge considered can be used in the system for modification of materials and products. | ||
333 | _aРежим доступа: по договору с организацией-держателем ресурса | ||
461 |
_tInstruments and Experimental Techniques _d2000- |
||
463 |
_tVol. 54, № 1 _v[P. 141-146] _d2011 |
||
610 | 1 | _aэлектронный ресурс | |
610 | 1 | _aтруды учёных ТПУ | |
610 | 1 | _aгенератор плазмы | |
610 | 1 | _aнизкое давление | |
610 | 1 | _aполный катод | |
701 | 1 |
_aLopatin _bI. V. |
|
701 | 1 |
_aAkhmadeev _bY. K. |
|
701 | 1 |
_aKoval _bN. N. _cspecialist in the field of electronics _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1948- _gNikolay Nikolaevich _2stltpush _3(RuTPU)RU\TPU\pers\34748 |
|
701 | 1 |
_aShchanin _bP. M. |
|
801 | 2 |
_aRU _b63413507 _c20161020 _gRCR |
|
856 | 4 | _uhttp://dx.doi.org/10.1134/S0020441211010179 | |
942 | _cCF |