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005 20231030040901.0
035 _a(RuTPU)RU\TPU\network\14290
035 _aRU\TPU\network\14288
090 _a649129
100 _a20160622a2008 k y0engy50 ba
101 0 _aeng
135 _adrcn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aNitriding of VT1-0 titanium in low-pressure non-self-maintained glow discharge with the use of different gas mixtures
_fY. K. Akhmadeev [et al.]
203 _aText
_celectronic
300 _aTitle screen
320 _a[References: p. 169-170 (11 tit.)]
330 _aThe results of nitriding of VT1-0 titanium in the plasma of non-self-maintained glow discharge with a hollow cathode are presented. A nitriding process has been implemented in different gas mixtures at low pressure and temperatures less than 650°C. It is shown that two-hour nitriding in a helium-nitrogen mixture leads to formation of a nitrided layer on the specimen’s surface. The obtained layer hardness of 14.5 GPa exceeds the hardness corresponding to pure nitrogen and argon-nitrogen nitriding by a factor of 2 and 1.5, respectively.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 _tJournal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques
_d2007-
463 _tVol. 2, № 1
_v[P. 166-170]
_d2008
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
610 1 _aтлеющий разряд
610 1 _aнизкое давление
610 1 _aгазовые смеси
610 1 _aазатирование титана
701 1 _aAkhmadeev
_bY. K.
701 1 _aIvanov
_bYu. F.
_cphysicist
_cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences
_f1955-
_gYuriy Fedorovich
_2stltpush
_3(RuTPU)RU\TPU\pers\33559
701 1 _aKoval
_bN. N.
_cspecialist in the field of electronics
_cProfessor of Tomsk Polytechnic University, Doctor of technical sciences
_f1948-
_gNikolay Nikolaevich
_2stltpush
_3(RuTPU)RU\TPU\pers\34748
701 1 _aLopatin
_bI. V.
701 1 _aShchanin
_bP. M.
712 0 2 _aНациональный исследовательский Томский политехнический университет (ТПУ)
_c(2009- )
_2stltpush
_3(RuTPU)RU\TPU\col\15902
801 2 _aRU
_b63413507
_c20161020
_gRCR
856 4 _uhttp://link.springer.com/article/10.1007/s11700-008-1026-9
942 _cCF