000 | 02486nlm1a2200409 4500 | ||
---|---|---|---|
001 | 649139 | ||
005 | 20231030040901.0 | ||
035 | _a(RuTPU)RU\TPU\network\14300 | ||
035 | _aRU\TPU\network\14296 | ||
090 | _a649139 | ||
100 | _a20160622a2005 k y0engy50 ba | ||
101 | 0 | _aeng | |
135 | _adrcn ---uucaa | ||
181 | 0 | _ai | |
182 | 0 | _ab | |
200 | 1 |
_aA facility for metal surface treatment with an electron beam _fN. N. Koval [et al.] |
|
203 |
_aText _celectronic |
||
300 | _aTitle screen | ||
320 | _a[References: p. 121 (8 tit.)] | ||
330 | _aA design for a facility for the surface treatment of metal samples is described, and the results from investigating the source of a high-current low-energy electron beam are presented. The electron beam, which has a current as high as 300 A, a pulse duration of 30 µs, and a pulse repetition rate of up to 10 Hz, is formed in a plasma-cathode gas-filled diode at an accelerating voltage of ~20 kV. The space-charge compensated electron beam is transported a distance of 20 cm in a longitudinal magnetic field to the region of its interaction with a solid body. At a current density as high as 100 A/cm2, the power density produced by the beam is sufficient for the metal surface to be melted in the duration of one or several pulses. Samples can be replaced in the facility without breaking the vacuum. | ||
333 | _aРежим доступа: по договору с организацией-держателем ресурса | ||
461 |
_tInstruments and Experimental Techniques _d2000- |
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463 |
_tVol. 48, № 1 _v[P. 117-121] _d2005 |
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610 | 1 | _aэлектронный ресурс | |
610 | 1 | _aтруды учёных ТПУ | |
610 | 1 | _aэлектронный пучок | |
610 | 1 | _aповерхность металла | |
610 | 1 | _aобработка | |
701 | 1 |
_aKoval _bN. N. _cspecialist in the field of electronics _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1948- _gNikolay Nikolaevich _2stltpush _3(RuTPU)RU\TPU\pers\34748 |
|
701 | 1 |
_aShchanin _bP. M. |
|
701 | 1 |
_aDevyatkov _bV. N. |
|
701 | 1 |
_aTolkachev _bV. S. |
|
701 | 1 |
_aVintizenko _bL. G. |
|
712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет (ТПУ) _c(2009- ) _2stltpush _3(RuTPU)RU\TPU\col\15902 |
801 | 2 |
_aRU _b63413507 _c20160622 _gRCR |
|
856 | 4 | _uhttp://dx.doi.org/10.1007/s10786-005-0023-0 | |
942 | _cCF |