000 03275nlm1a2200373 4500
001 649150
005 20231030040901.0
035 _a(RuTPU)RU\TPU\network\14311
035 _aRU\TPU\network\14301
090 _a649150
100 _a20160622a2016 k y0engy50 ba
101 0 _aeng
102 _aUS
135 _adrcn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aFlexible antibacterial Zr-Cu-N thin films resistant to cracking
_fY. Musil [et al.]
203 _aText
_celectronic
300 _aTitle screen
320 _a[References: 40 tit.]
330 _aThis study investigates how the Cu concentration in Zr-Cu-N films affects the films' antibacterial capacity and mechanical properties. Zr-Cu-N films were prepared by reactive magnetron sputtering from composed Zr/Cu targets using a dual magnetron in an Ar + N2 mixture. The antibacterial capacity of Zr-Cu-N films was tested on Escherichia coli (E. coli) bacteria. The mechanical properties of Zr-Cu-N filmswere determined from the load vs. displacement curves measured using a Fisherscope H 100microhardness tester. The antibacterial capacity was modulated by the amount of Cu added to the Zr-Cu-N film. The mechanical properties were varied based on the energy Ei delivered to the growing film by bombarding ions. It was found that it is possible to form Zr-Cu-N films with Cu concentrations ≥10 at. % that simultaneously exhibit (1) 100% killing efficiency Ek for E. colibacteria on their surfaces, and (2) (1) high hardness H of about 25 GPa, (2) high ratio H/E* ≥ 0.1, (3) high elastic recovery We ≥ 60% and (4) compressive macrostress (σ < 0). The Zr-Cu-N films with these parameters are flexible/antibacterial filmsthat exhibit enhanced resistance to cracking. This enhanced resistance was tested by (1) bending the Mo and Ti strip coated by sputtered Zr-Cu-N films (bending test) and (2) loading the surface of the Zr-Cu-Nsputtered on a Si substrate by a diamond indenter at high loads up to 1 N (indentation test). Physical, mechanical, and antibacterial properties of Zr-Cu-N films are described in detail. In summary, it can be concluded that Zr-Cu-N is a promising new material for creating flexible antibacterial coatings on contact surfaces.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 _tJournal of Vacuum Science and Technology A
463 _tVol. 34, iss. 2
_v[7 p.]
_d2015
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
701 1 _aMusil
_bY.
_cphysicist
_cLeading researcher of Tomsk Polytechnic University, Doctor of physical and mathematical sciences
_f1934-
_gYindrikh
_2stltpush
_3(RuTPU)RU\TPU\pers\36957
701 1 _aZitek
_bM.
_gMichal
701 1 _aFajfrlik
_bK.
_gKarel
701 1 _aCerstvy
_bR.
_gRadomir
712 0 2 _aНациональный исследовательский Томский политехнический университет (ТПУ)
_bИнститут физики высоких технологий (ИФВТ)
_bЛаборатория № 1
_h6378
_2stltpush
_3(RuTPU)RU\TPU\col\19035
801 2 _aRU
_b63413507
_c20160622
_gRCR
856 4 _uhttp://dx.doi.org/10.1116/1.4937727
942 _cCF