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001 657795
005 20231030041526.0
035 _a(RuTPU)RU\TPU\network\24556
090 _a657795
100 _a20180321a2017 k y0engy50 ba
101 1 _aeng
_deng
102 _aUS
135 _adrcn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aFeatures of focusing of a high-intensity pulsed ion beam formed by a diode with a passive anode
_fX. P. Zhu [et al.]
203 _aText
_celectronic
300 _aTitle screen
320 _a[References: p. 569 (22 tit.)]
330 _aThe results of investigating the focusing of a high-power ion beam, which is formed by a diode with a semicylindrical geometry and a passive anode, are presented. Two types of focusing diodes were investigated: with external magnetic insulation (one-pulse mode) and self-magnetic insulation of electrons (twopulse mode). Measurements of the energy-density distribution of the ion beam and the ion-current density were performed. It was found that when the diode operates in the two-pulse mode, the region of the maximum ion-beam energy density in the focal plane is displaced relative to the region of the maximum ion-current density by 5–10 mm. It is shown that the effect of a displacement of the focal spot with the maximum energy density is determined by the presence of a large number of accelerated neutral atoms in the ion beam. These atoms are produced as a result of the ion charge-exchange process in the anode–cathode gap of the ion diode during its operation in the two-pulse mode.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 _tInstruments and Experimental Techniques
_d1956-
463 _tVol. 60, iss. 4
_v[P. 562–569]
_d2017
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
610 1 _aионные пучки
610 1 _aэлектроды
610 1 _aдиоды
701 1 _aZhu
_bX. P.
701 1 _aDing
_bL.
701 1 _aZhang
_bQ.
701 1 _aPushkarev
_bA. I.
_cphysicist
_cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences, Senior researcher
_f1954-
_gAleksandr Ivanovich
_2stltpush
_3(RuTPU)RU\TPU\pers\32701
701 1 _aLei
_bM. K.
712 0 2 _aНациональный исследовательский Томский политехнический университет
_bИнженерная школа новых производственных технологий
_bОтделение материаловедения
_h7871
_2stltpush
_3(RuTPU)RU\TPU\col\23508
801 2 _aRU
_b63413507
_c20180321
_gRCR
856 4 _uhttps://doi.org/10.1134/S0020441217030277
942 _cCF