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100 _a20200127a2020 k y0engy50 ba
101 0 _aeng
135 _adrcn ---uucaa
181 0 _ai
182 0 _ab
200 1 _aPlasma-Chemical Deposition of Anti-Reflection and Protective Coating for Infrared Optics
_dПлазмохимическое осаждение антиотражающего и защитного покрытия для ИК-оптики
_fA. S. Grenaderov, K. V. Oskomov, A. A. Soloviev (Solovyev) [et al.]
203 _aText
_celectronic
300 _aTitle screen
320 _a[References: 21 tit.]
330 _aThe films of amorphous hydrogenated carbon doped with Si and O were deposited onto the sample of crystalline silicon by method of plasma-chemical deposition in the mix of polyphenyl methylsiloxane vapors and argon. Physico-mechanical and optical properties of films were examined for their use as anti-reflection and protective coatings in infrared optics devices. Film transparency in the wavelength range of 2.5-8 μm was measured by method of infrared spectroscopy with a Fourier transform. The structure and composition of films were studied by methods of Raman and X-ray photoelectron spectroscopy. Hardness and other mechanical properties of films were determined by nanoindentation. It was shown that the double-sided deposition of a-C:H:SiOx films onto Si plates allows increasing their integrated transmission in the wavelength region of 3- 5 μm from 50 to 87%. The films possess excellent mechanical characteristics, thermal stability in the temperature range from room temperature to 500°С, and resistance to aqueous solutions of salt.
333 _aРежим доступа: по договору с организацией-держателем ресурса
461 _tRussian Physics Journal
463 _tVol. 62, iss. 11
_v[P. 2112-2120]
_d2020
510 1 _aПлазмохимическое осаждение антиотражающего и защитного покрытия для ИК-оптики
_zrus
610 1 _aэлектронный ресурс
610 1 _aтруды учёных ТПУ
610 1 _aanti-reflection coatings
610 1 _aprotective coatings
610 1 _ainfrared optics
610 1 _aplasma-chemical synthesis
701 1 _aGrenaderov
_bA. S.
_gAleksandr Sergeevich
701 1 _aOskomov
_bK. V.
_gKonstantin Vladimirovich
701 1 _aSoloviev (Solovyev)
_bA. A.
_cspecialist in the field of hydrogen energy
_cAssociate Professor of Tomsk Polytechnic University, Candidate of technical sciences
_f1977-
_gAndrey Aleksandrovich
_2stltpush
_3(RuTPU)RU\TPU\pers\30863
701 1 _aSelivanova
_bA. V.
_gAleksandra Viktorovna
701 1 _aKonishchev
_bM. E.
_cphysicist
_cengineer of Tomsk Polytechnic University, post graduate
_f1987-
_gMaksim Evgenievich
_2stltpush
_3(RuTPU)RU\TPU\pers\34212
712 0 2 _aНациональный исследовательский Томский политехнический университет
_bИнженерная школа ядерных технологий
_bНаучно-образовательный центр Б. П. Вейнберга
_h7866
_2stltpush
_3(RuTPU)RU\TPU\col\23561
712 0 2 _aНациональный исследовательский Томский политехнический университет
_bИсследовательская школа физики высокоэнергетических процессов
_c(2017- )
_h8118
_2stltpush
_3(RuTPU)RU\TPU\col\23551
801 2 _aRU
_b63413507
_c20210121
_gRCR
856 4 0 _uhttps://doi.org/10.1007/s11182-019-01835-4
942 _cCF