| 000 | 02639nlm1a2200385 4500 | ||
|---|---|---|---|
| 001 | 662124 | ||
| 005 | 20231030041810.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\33258 | ||
| 035 | _aRU\TPU\network\22362 | ||
| 090 | _a662124 | ||
| 100 | _a20200520a2020 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 102 | _aGB | ||
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aSelf-images contrast enhancement for displacement Talbot lithography by means of composite mesoscale amplitude-phase masks _fYu. E. Geints, O. V. Minin, I. V. Minin, Yu. E. Zemlyanov |
|
| 203 |
_aText _celectronic |
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| 300 | _aTitle screen | ||
| 320 | _a[References: 39 tit.] | ||
| 330 | _aWe propose a new design of composite wavelength-scale amplitude-phase diffraction grating as applied to the displacement Talbot lithography. The grating is composed of a conventional metal amplitude binary mask with superposed dielectric phase steps and provides for manyfold optical contrast enhancement of the integrated 'Talbot carpet' as opposed to the amplitude and phase masks purely. By means of the finite element calculations, we analyze the spatial field structure in the proposed gratings with different geometric ridge shapes and show that due to Mie-type resonances excitation the semielliptical dielectric steps in the combination with metal amplitude mask demonstrate excellent spatial resolution (~${\lambda }/4$) and highest optical contrast (~22 dB) of integrated Talbot self-images. | ||
| 461 | _tJournal of Optics | ||
| 463 |
_tVol. 22, iss. 1 _v[015002, 9 p.] _d2020 |
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| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _aконтрастность | |
| 610 | 1 | _aизображения | |
| 701 | 1 |
_aGeints _bYu. E. _gYuri |
|
| 701 | 1 |
_aMinin _bO. V. _cphysicist _cprofessor of Tomsk Polytechnic University, Doctor of technical sciences _f1960- _gOleg Vladilenovich _2stltpush _3(RuTPU)RU\TPU\pers\44941 |
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| 701 | 1 |
_aMinin _bI. V. _cphysicist _cSenior researcher of Tomsk Polytechnic University, Doctor of technical sciences _f1960- _gIgor Vladilenovich _2stltpush _3(RuTPU)RU\TPU\pers\37571 |
|
| 701 | 1 |
_aZemlyanov _bYu. E. _gAlexander |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИнженерная школа неразрушающего контроля и безопасности _bОтделение электронной инженерии _h7977 _2stltpush _3(RuTPU)RU\TPU\col\23507 |
| 801 | 2 |
_aRU _b63413507 _c20200520 _gRCR |
|
| 856 | 4 | _uhttps://doi.org/10.1088/2040-8986/ab5b7d | |
| 942 | _cCF | ||