| 000 | 02415nlm1a2200349 4500 | ||
|---|---|---|---|
| 001 | 662227 | ||
| 005 | 20231030041814.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\33362 | ||
| 035 | _aRU\TPU\tpu\28442 | ||
| 090 | _a662227 | ||
| 100 | _a20200603a1998 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 135 | _adrcn ---uucaa | ||
| 200 | 1 |
_aPlasma-assisted deposition of a three-layer structure by vacuum and gas arcs _fD. P. Borisov [et al.] |
|
| 300 | _aTitle screen. | ||
| 320 | _a[References: p. 1684 (9 tit.)] | ||
| 330 | _aThe durability and adhesion of thin coatings often depends on the structure and properties of the layer intermediate between the coating and the substrate, especially in the case where the layer and the substrate are highly different in microhardness. With a vacuum arc and a hot-cathode arc, a process has been arranged which involves cleaning of the surface, nitration of the article, and deposition of a coating. As a result, a three-layer composition has been produced which consists of a TiN layer of thickness up to 5 ?m and microhardness 20 GPa, an intermediate Fe4N layer of thickness up to 8 ?m and microhardness 7.5 GPa, and a nitrated layer of thickness up to 100 ?m with a gradually varying microhardness. With the TiN layer showing high adhesion, the coating has a durability three of four times greater than that of a coating produced with the use of a conventional technology. | ||
| 333 | _aРежим доступа: по договору с организацией-держателем ресурса | ||
| 461 |
_tIEEE Transactions on Plasma Science _d1973- |
||
| 463 |
_tVol. 26, № 6 _v[P. 1680-1684] _d1998 |
||
| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _aсоединения железа | |
| 610 | 1 | _aплазма | |
| 701 | 1 |
_aBorisov _bD. P. |
|
| 701 | 1 |
_aGoncharenko _bI. M. |
|
| 701 | 1 |
_aKoval _bN. N. _cspecialist in the field of electronics _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1948- _gNikolay Nikolaevich _2stltpush _3(RuTPU)RU\TPU\pers\34748 |
|
| 701 | 1 |
_aSchanin _bP. M. |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет (ТПУ) _c(2009- ) _2stltpush _3(RuTPU)RU\TPU\col\15902 |
| 801 | 2 |
_aRU _b63413507 _c20200603 _gRCR |
|
| 856 | 4 | _uhttp://dx.doi.org/10.1109/27.747886 | |
| 942 | _cCF | ||