| 000 | 03175nlm1a2200469 4500 | ||
|---|---|---|---|
| 001 | 663931 | ||
| 005 | 20231030041912.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\35101 | ||
| 035 | _aRU\TPU\network\32670 | ||
| 090 | _a663931 | ||
| 100 | _a20210318a2019 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aModelling of transition zone formation between thin Si or Ta film deposited on TiNi under low-energy electron beam irradiation _fA. G. Knyazeva, O. N. Kryukova, A. L. Maslov |
|
| 203 |
_aText _celectronic |
||
| 300 | _aTitle screen | ||
| 320 | _a[References: 52 tit.] | ||
| 330 | _aNickel titanium or nitinol is very often coated by biocompatible and corrosion-resistant silicon and tantalum coatings. One of the methods for the formation of a continuous transition zone between the coating and nitinol is pulsed or continuous electron beam treatment. Surface heating accelerates diffusion processes that facilitate the formation of new phases. However, the interpretation of experimental results is hindered due to the impossibility of directly observing the processes. Here we model the phenomena accompanying the transition zone formation. The mathematical model used takes into account thermal and diffusion phenomena and the stages of the main chemical reactions in the heated area. Numerical studies revealed that the transition zone for the two types of films is formed differently: in the case of silicon the transition zone grows inside nickel titanium, while in the case of tantalum it is formed mainly in the area of the deposited film. The interaction of competing stages determines the absence of regularities in the oxide phase formation under varying treatment conditions. | ||
| 333 | _aРежим доступа: по договору с организацией-держателем ресурса | ||
| 461 | _tMaterials Research Express | ||
| 463 |
_tVol. 6, iss. 10 _v[1065g5, 11 p.] _d2019 |
||
| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _atitanium nickelide | |
| 610 | 1 | _acoating | |
| 610 | 1 | _atransient zone | |
| 610 | 1 | _achemical reactions | |
| 610 | 1 | _amodeling | |
| 610 | 1 | _aникелид титана | |
| 610 | 1 | _aпокрытия | |
| 610 | 1 | _aпереходные зоны | |
| 610 | 1 | _aхимические реакции | |
| 610 | 1 | _aмоделирование | |
| 700 | 1 |
_aKnyazeva _bA. G. _cRussian physicist _cProfessor of Tomsk Polytechnic University, doctor of physico-mathematical Sciences _f1962- _gAnna Georgievna _2stltpush _3(RuTPU)RU\TPU\pers\32712 |
|
| 701 | 1 |
_aKryukova _bO. N. _gOlga Nikolaevna |
|
| 701 | 1 |
_aMaslov _bA. L. _gAleksey Leonidovich |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИнженерная школа новых производственных технологий _bОтделение материаловедения _h7871 _2stltpush _3(RuTPU)RU\TPU\col\23508 |
| 801 | 2 |
_aRU _b63413507 _c20210318 _gRCR |
|
| 856 | 4 | _uhttps://doi.org/10.1088/2053-1591/ab41a5 | |
| 942 | _cCF | ||