| 000 | 02810nlm1a2200469 4500 | ||
|---|---|---|---|
| 001 | 665023 | ||
| 005 | 20231030041949.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\36222 | ||
| 035 | _aRU\TPU\network\36196 | ||
| 090 | _a665023 | ||
| 100 | _a20210623a2020 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aThermionic Vacuum Arc-A Versatile Technology for Thin Film Deposition and Its Applications _fR. Vladoiu, M. Tichy, A. Mandes [et al.] |
|
| 203 |
_aText _celectronic |
||
| 300 | _aTitle screen | ||
| 320 | _a[References: 253 tit.] | ||
| 330 | _aThis review summarizes the more-than-25-years of development of the so-called thermionic vacuum arc (TVA). TVA is an anodic arc discharge in vapors of the material to be deposited; the energy for its melting is delivered by means of a focused electron beam. The resulting material ions fall at the substrate where they form a well-adhesive layer; the ion energy is controllable. The deposited layers are, as a rule, free from droplets typical for cathodic arc deposition systems and the thermal stress of the substrates being coated is low. TVA is especially suitable for processing refractory metals, e.g., carbon or tungsten, however, in the course of time, various useful applications of this system originated. They include layers for fusion application, hard coatings, low-friction coatings, biomedical-applicable films, materials for optoelectronics, and for solid-state batteries. Apart from the diagnostic of the film properties, also the diagnostic of the TVA discharge itself as well as of the by TVA generated plasma was performed. The research and application of the TVA proceeds in broad international collaboration. At present, the TVA technology has found its firm place among the different procedures for thin film deposition. | ||
| 461 | _tCoatings | ||
| 463 |
_tVol. 10, iss. 3 _v[211, 48 p.] _d2020 |
||
| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _athermionic vacuum arc | |
| 610 | 1 | _athin film deposition | |
| 610 | 1 | _afusion | |
| 610 | 1 | _arefractory materials | |
| 610 | 1 | _acoatings | |
| 610 | 1 | _aвакуумные дуги | |
| 610 | 1 | _aосаждение | |
| 610 | 1 | _aтонкие пленки | |
| 610 | 1 | _aогнеупорные материалы | |
| 610 | 1 | _aпокрытия | |
| 701 | 1 |
_aVladoiu _bR. _gRodica |
|
| 701 | 1 |
_aTichy _bM. _cchemist _cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences _f1947- _gMilan _2stltpush _3(RuTPU)RU\TPU\pers\35771 |
|
| 701 | 1 |
_aMandes _bA. _gAurelia |
|
| 701 | 1 |
_aDinca _bV. _gVirginia |
|
| 701 | 1 |
_aKudrn _bP. _gPavel |
|
| 801 | 2 |
_aRU _b63413507 _c20210623 _gRCR |
|
| 856 | 4 | _uhttps://doi.org/10.3390/coatings10030211 | |
| 942 | _cCF | ||