| 000 | 03150nlm1a2200481 4500 | ||
|---|---|---|---|
| 001 | 666418 | ||
| 005 | 20231030042036.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\37622 | ||
| 035 | _aRU\TPU\network\33154 | ||
| 090 | _a666418 | ||
| 100 | _a20211223a2022 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 102 | _aNL | ||
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aTalbot photolithography optimization with engineered hybrid metal-dielectric mask: High-contrast and highly-uniform Talbot stripes _fYu. E. Geynts, I. V. Minin, O. V. Minin |
|
| 203 |
_aText _celectronic |
||
| 300 | _aTitle screen | ||
| 320 | _a[References: 32 tit.] | ||
| 330 | _aConventional projection Talbot lithography usually employs opaque (amplitude) or transparent (phase) masks for creating a periodic array of Fresnel diffraction fringes in the photosensitive substrate. For particular mask design the longitudinal periodicity of Talbot carpet can be avoided producing quasi uniform striped pattern (Talbot stripes). We propose a novel hybrid amplitude-phase mask which is engineered for obtaining extremely smooth Talbot stripes and simultaneously high lateral optical contrast and extreme spatial resolution better than a third of laser wavelength. By means of the numerical simulations, we demonstrate the robustness of produced striped diffraction patterns against mask design deviation and light incidence angle variations. The reproducibility of the Talbot stripes is reported also for 1D and 2D metal-dielectric projection masks. | ||
| 333 | _aРежим доступа: по договору с организацией-держателем ресурса | ||
| 461 | _tOptics and Laser Technology | ||
| 463 |
_tVol. 148 _v[107776, 8 p.] _d2022 |
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| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _aTalbot lithography | |
| 610 | 1 | _awavelength-scaled diffraction grating | |
| 610 | 1 | _aoptical contrast | |
| 610 | 1 | _aprojection mask | |
| 610 | 1 | _aлитография | |
| 610 | 1 | _aдифракционные решетки | |
| 610 | 1 | _aмасштабирование | |
| 610 | 1 | _aоптический контраст | |
| 610 | 1 | _aфотолитография | |
| 610 | 1 | _aполосы Тальбота | |
| 700 | 1 |
_aGeynts _bYu. E. _gYury Elmarovich |
|
| 701 | 1 |
_aMinin _bI. V. _cphysicist _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1960- _gIgor Vladilenovich _2stltpush _3(RuTPU)RU\TPU\pers\37571 |
|
| 701 | 1 |
_aMinin _bO. V. _cphysicist _cprofessor of Tomsk Polytechnic University, Doctor of technical sciences _f1960- _gOleg Vladilenovich _2stltpush _3(RuTPU)RU\TPU\pers\44941 |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИнженерная школа неразрушающего контроля и безопасности _bОтделение электронной инженерии _h7977 _2stltpush _3(RuTPU)RU\TPU\col\23507 |
| 801 | 2 |
_aRU _b63413507 _c20211223 _gRCR |
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| 856 | 4 | _uhttps://doi.org/10.1016/j.optlastec.2021.107776 | |
| 942 | _cCF | ||