| 000 | 04129nlm1a2200661 4500 | ||
|---|---|---|---|
| 001 | 666436 | ||
| 005 | 20231030042037.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\37640 | ||
| 035 | _aRU\TPU\network\37574 | ||
| 090 | _a666436 | ||
| 100 | _a20211224a2021 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 102 | _aCH | ||
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aExperimental Study and Mathematical Modeling of the Processes Occurring in ZrN Coating/Silumin Substrate Systems under Pulsed Electron Beam Irradiation _fN. N. Koval, T. V. Koval, O. V. Krysina [et al.] |
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| 203 |
_aText _celectronic |
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| 300 | _aTitle screen | ||
| 320 | _a[References: 40 tit.] | ||
| 330 | _aThis paper presents a study of a combined modification of silumin, which included deposition of a ZrN coating on a silumin substrate and subsequent treatment of the coating/substrate system with a submillisecond pulsed electron beam. The local temperature on the samples in the electron-beam-affected zone and the thickness of the melt zone were measured experimentally and calculated using a theoretical model. The Stefan problem was solved numerically for the fast heating of bare and ZrN-coated silumin under intense electron beam irradiation. Time variations of the temperature field, the position of the crystallization front, and the speed of the front movement have been calculated. It was found that when the coating thickness was increased from 0.5 to 2 [mu]m, the surface temperature of the samples increased from 760 to 1070 °C, the rise rate of the surface temperature increased from 6×107 to 9×107 K/s, and the melt depth was no more than 57 μm. The speed of the melt front during the pulse was 3×105 [mu]m/s. Good agreement was observed between the experimental and theoretical values of the temperature characteristics and melt zone thickness. | ||
| 461 | _tCoatings | ||
| 463 |
_tVol. 11, iss. 12 _v[1461, 15 p.] _d2021 |
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| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _apulsed electron beam | |
| 610 | 1 | _aelectron beam treatment | |
| 610 | 1 | _avacuum arc deposition | |
| 610 | 1 | _aZrN coating | |
| 610 | 1 | _asilumin substrate | |
| 610 | 1 | _acoating/substrate system | |
| 610 | 1 | _atemperature measurement | |
| 610 | 1 | _amathematical modeling | |
| 610 | 1 | _acrystallization rate | |
| 610 | 1 | _amelt depth | |
| 610 | 1 | _aимпульсные электронные пучки | |
| 610 | 1 | _aэлектронно-лучевая обработка | |
| 610 | 1 | _aвакуумно-дуговое напыление | |
| 610 | 1 | _aпокрытия | |
| 610 | 1 | _aподложки | |
| 610 | 1 | _aматематическое моделирование | |
| 610 | 1 | _aкристаллизация | |
| 610 | 1 | _aтаяние | |
| 610 | 1 | _aтемпература | |
| 701 | 1 |
_aKoval _bN. N. _cspecialist in the field of electronics _cProfessor of Tomsk Polytechnic University, Doctor of technical sciences _f1948- _gNikolay Nikolaevich _2stltpush _3(RuTPU)RU\TPU\pers\34748 |
|
| 701 | 1 |
_aKoval _bT. V. _cmathematician, physicist _cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences _f1953- _gTamara Vasilievna _2stltpush _3(RuTPU)RU\TPU\pers\34227 |
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| 701 | 1 |
_aKrysina _bO. V. _gOlga Vasiljevna |
|
| 701 | 1 |
_aIvanov _bYu. F. _gYury Fedorovich |
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| 701 | 1 |
_aTeresov _bA. D. _gAnton Dmitrievich |
|
| 701 | 1 |
_aMoskvin _bP. V. _gPavel Vladimirovich |
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| 701 | 0 | _aMy Kim An Tran | |
| 701 | 1 |
_aProkopenko _bN. A. _gNikita Andreevich |
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| 701 | 1 |
_aPetrikova _bE. A. _gElizaveta Alekseevna |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИнженерная школа информационных технологий и робототехники _bОтделение информационных технологий _h7951 _2stltpush _3(RuTPU)RU\TPU\col\23515 |
| 801 | 2 |
_aRU _b63413507 _c20220607 _gRCR |
|
| 856 | 4 | _uhttp://earchive.tpu.ru/handle/11683/71109 | |
| 856 | 4 | _uhttps://doi.org/10.3390/coatings11121461 | |
| 942 | _cCF | ||