| 000 | 03659nlm1a2200457 4500 | ||
|---|---|---|---|
| 001 | 667108 | ||
| 005 | 20231030042059.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\38312 | ||
| 090 | _a667108 | ||
| 100 | _a20220222a2021 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 135 | _adrcn ---uucaa | ||
| 200 | 1 |
_aFeatures of the Formation of Ultralow Energy High-Intensity Metal and Gaseous Ion Beams _fA. I. Ryabchikov, S. V. Dektyarev, O. S. Korneva, D. O. Sivin |
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| 300 | _aTitle screen | ||
| 320 | _a[References: 51 tit.] | ||
| 330 | _aThis article studies the features and patterns of the formation of high-intensity beams of metal and gaseous ions of low and ultralow energy from dc vacuum arc and gas-discharge plasma. It presents the results of repetitively pulsed plasma immersion extraction of aluminum, titanium, and nitrogen ions from the plasma followed by the formation and transport of ion beam under conditions of its ballistic focusing. This article presents the experimental data on the influence of the grid focusing electrode cell sizes of 150 and 500 ?m , the bias potential amplitude from 0.1 to 2 kV, the conditions for neutralizing the space charge of the beam during preliminary plasma injection into drift space and when using an additional thermoelectron source on the transport and focusing of ion beams. Here, it discusses the effect of the characteristic dimensions of the fine-structured grid and plasma parameters at ultralow bias potential amplitudes and the presence of significant initial energy in ions on the ion beam focusing. It was found that at bias potential amplitudes of 0.6 kV, it is possible to form repetitively pulsed ion beams with high current density reaching 170 mA/cm 2 . The obtaining of such beams opens up the possibility of implementing the method of high-intensity ion implantation under conditions of multiple decreases in the irradiated surface sputtering. | ||
| 461 | _tIEEE Transactions on Plasma Science | ||
| 463 |
_tVol. 49, iss. 9 _v[P. 2559-2566] _d2021 |
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| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _aions | |
| 610 | 1 | _aion beams | |
| 610 | 1 | _aelectric potential | |
| 610 | 1 | _aelectrodes | |
| 610 | 1 | _aparticle beams | |
| 610 | 1 | _afocusing | |
| 610 | 1 | _ametals | |
| 610 | 1 | _aионы | |
| 610 | 1 | _aионные пучки | |
| 610 | 1 | _aэлектроды | |
| 610 | 1 | _aэлектрический потенциал | |
| 610 | 1 | _aфокусировка | |
| 610 | 1 | _aметаллы | |
| 701 | 1 |
_aRyabchikov _bA. I. _cProfessor of Tomsk Polytechnic University, Doctor of physical and mathematical sciences _cphysicist _f1950- _gAleksandr Ilyich _2stltpush _3(RuTPU)RU\TPU\pers\30912 |
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| 701 | 1 |
_aDektyarev _bS. V. _cphysicist _cdesign engineer of Tomsk Polytechnic University _f1957- _gSergey Valentinovich _2stltpush _3(RuTPU)RU\TPU\pers\35672 |
|
| 701 | 1 |
_aKorneva _bO. S. _cphysicist _cengineer of Tomsk Polytechnic University _f1988- _gOlga Sergeevna _2stltpush _3(RuTPU)RU\TPU\pers\37178 |
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| 701 | 1 |
_aSivin _bD. O. _cphysicist _cSenior researcher of Tomsk Polytechnic University, Candidate of technical sciences _f1978- _gDenis Olegovich _2stltpush _3(RuTPU)RU\TPU\pers\34240 |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИнженерная школа ядерных технологий _bНаучная лаборатория высокоинтенсивной имплантации ионов _h7868 _2stltpush _3(RuTPU)RU\TPU\col\23698 |
| 801 | 2 |
_aRU _b63413507 _c20220222 _gRCR |
|
| 856 | 4 | _uhttps://doi.org/10.1109/TPS.2021.3083327 | |
| 942 | _cCF | ||