| 000 | 02999nlm1a2200457 4500 | ||
|---|---|---|---|
| 001 | 667248 | ||
| 005 | 20231030042104.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\38453 | ||
| 035 | _aRU\TPU\network\38364 | ||
| 090 | _a667248 | ||
| 100 | _a20220310a2018 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aUltra-sensitive, sustainable, and selective electrochemical hydrazine detection by ALD-developed two-dimensional WO3 _fWei Zihan, Hai Zhenyin, M. K. Akbari [et al.] |
|
| 203 |
_aText _celectronic |
||
| 300 | _aTitle screen | ||
| 320 | _a[References: 56 tit.] | ||
| 330 | _aWafer-scale two-dimensional (2D) WO3 films with different thicknesses of 0.78, 1.4, 3.6, and 6.5 nm were fabricated on Au-SiO2/Si substrates using an atomic layer deposition technique. Their surface morphologies and chemical components were examined by field-emission scanning electron microscopy, atomic force microscopy and X-ray photoelectron spectroscopy. Cyclic voltammetry, chronoamperometry and electrochemical impedance spectroscopy were utilized for the analysis of the electrochemical behavior of 2D WO3 films towards hydrazine detection under various conditions. The effect of the thickness of 2D WO3 on the electrochemical performance was also analyzed. Significant improvement in hydrazine sensing capabilities was obtained for monolayer 2D WO3 (0.78 nm), demonstrating a high sensitivity of 1.24 [mu]A μM−1 cm−2, a linear hydrazine concentration detection ranging from 0.2 to 2100 [mu]M, great long-term stability, excellent selectivity and the lowest limit of detection of 0.015 [mu]M reported to date, which provide a great potential method for materials fabrication in the development of high-performance hydrazine detection. | ||
| 461 | _tChemElectroChem | ||
| 463 |
_tVol. 5, iss. 2 _v[P. 266-272] _d2018 |
||
| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _aгидразины | |
| 610 | 1 | _aповерхности | |
| 610 | 1 | _aатомные слои | |
| 610 | 1 | _aосаждение | |
| 610 | 1 | _aморфология | |
| 610 | 1 | _aподложки | |
| 701 | 0 | _aWei Zihan | |
| 701 | 0 | _aHai Zhenyin | |
| 701 | 1 |
_aAkbari _bM. K. _gMohammad Karbalaei |
|
| 701 | 0 | _aHu Jie | |
| 701 | 0 | _aHyde Lachlan | |
| 701 | 1 |
_aVerpoort _bF. V. K. _cChemical Engineer _cProfessor of Tomsk Polytechnic University, doctor of chemical Sciences _f1963- _gFrensis Valter Kornelius _2stltpush _3(RuTPU)RU\TPU\pers\35059 |
|
| 701 | 1 |
_aZhuiykov _bS. _gSerge |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИсследовательская школа химических и биомедицинских технологий _c(2017- ) _h8120 _2stltpush _3(RuTPU)RU\TPU\col\23537 |
| 801 | 2 |
_aRU _b63413507 _c20220310 _gRCR |
|
| 856 | 4 | _uhttps://doi.org/10.1002/celc.201700968 | |
| 942 | _cCF | ||