| 000 | 03200nlm1a2200613 4500 | ||
|---|---|---|---|
| 001 | 669256 | ||
| 005 | 20231030042216.0 | ||
| 035 | _a(RuTPU)RU\TPU\network\40496 | ||
| 035 | _aRU\TPU\network\40492 | ||
| 090 | _a669256 | ||
| 100 | _a20230310a2023 k y0engy50 ba | ||
| 101 | 0 | _aeng | |
| 102 | _aCH | ||
| 135 | _adrcn ---uucaa | ||
| 181 | 0 | _ai | |
| 182 | 0 | _ab | |
| 200 | 1 |
_aCombined HF+MW CVD Approach for the Growth of Polycrystalline Diamond Films with Reduced Bow _fV. Sedov, A. Popovich, S. A. Linnik [et al.] |
|
| 203 |
_aText _celectronic |
||
| 300 | _aTitle screen | ||
| 320 | _a[References: 56 tit.] | ||
| 330 | _aA combination of two methods of chemical vapor deposition (CVD) of diamond films, microwave plasma–assisted (MW CVD) and hot filament (HF CVD), was used for the growth of 100 µm-thick polycrystalline diamond (PCD) layers on Si substrates. The bow of HF CVD and MW CVD films showed opposite convex\concave trends; thus, the combined material allowed reducing the overall bow by a factor of 2–3. Using MW CVD for the growth of the initial 25 µm-thick PCD layer allowed achieving much higher thermal conductivity of the combined 110 µm-thick film at 210 W/m?K in comparison to 130 W/m?K for the 93 µm-thick pure HF CVD film. | ||
| 461 | _tCoatings | ||
| 463 |
_tVol. 13, iss. 2 _v[380, 10 p.] _d2023 |
||
| 610 | 1 | _aэлектронный ресурс | |
| 610 | 1 | _aтруды учёных ТПУ | |
| 610 | 1 | _adiamond | |
| 610 | 1 | _athin film | |
| 610 | 1 | _achemical vapor deposition | |
| 610 | 1 | _amicrowave plasma | |
| 610 | 1 | _athermal conductivity | |
| 610 | 1 | _aRaman spectroscopy | |
| 610 | 1 | _aалмаз | |
| 610 | 1 | _aтонкие пленки | |
| 610 | 1 | _aхимическое осаждение | |
| 610 | 1 | _aмикроволновая плазма | |
| 610 | 1 | _aтеплопроводность | |
| 610 | 1 | _aрамановская спектроскопия | |
| 701 | 1 |
_aSedov _bV. _gVadim |
|
| 701 | 1 |
_aPopovich _bA. _gAlexey |
|
| 701 | 1 |
_aLinnik _bS. A. _cphysicist _cEngineer-Researcher of Tomsk Polytechnic University _f1985- _gStepan Andreevich _2stltpush _3(RuTPU)RU\TPU\pers\32877 |
|
| 701 | 1 |
_aMartyanov _bA. _gArtem |
|
| 701 | 1 |
_aWei _bJ. _gJunjun |
|
| 701 | 1 |
_aZenkin _bS. P. _cphysicist _cResearcher of Tomsk Polytechnic University _f1988- _gSergey Petrovich _2stltpush _3(RuTPU)RU\TPU\pers\41880 |
|
| 701 | 1 |
_aZavedeev _bE. _gEvgeny |
|
| 701 | 1 |
_aSavin _bS. _gSergey |
|
| 701 | 1 |
_aGaydaychuk _bA. V. _cphysicist _cPostgraduate, Engineer - Researcher of Tomsk Polytechnic University _f1984- _gAlexander Valerievich _2stltpush _3(RuTPU)RU\TPU\pers\32876 |
|
| 701 | 1 |
_aLi _bCh. _gChengming |
|
| 701 | 1 |
_aRalchenko _bV. _gVictor |
|
| 701 | 1 |
_aKonov _bV. _gVitaly |
|
| 712 | 0 | 2 |
_aНациональный исследовательский Томский политехнический университет _bИсследовательская школа физики высокоэнергетических процессов _c(2017- ) _h8118 _2stltpush _3(RuTPU)RU\TPU\col\23551 |
| 801 | 2 |
_aRU _b63413507 _c20230329 _gRCR |
|
| 856 | 4 | _uhttp://earchive.tpu.ru/handle/11683/74890 | |
| 856 | 4 | _uhttps://doi.org/10.3390/coatings13020380 | |
| 942 | _cCF | ||