APA

Piestrup M. A., Powell M. W., Cremer J. T., Lombardo L. W., Kaplin V. V., Uglov S. R., Zabaev V. N., Skopik D. M., Silzer R. M., Retzlaff G. A. & Mikhalchuk A. A.Compact recycled beam source for XRL and EUVL exposure tools. : .

Chicago

Piestrup M A, Powell M W, Cremer J T, Lombardo L W, Kaplin V V, Uglov S R, Zabaev V N, Skopik D M, Silzer R M, Retzlaff G A and Mikhalchuk A A.Compact recycled beam source for XRL and EUVL exposure tools. : .

Harvard

Piestrup M. A., Powell M. W., Cremer J. T., Lombardo L. W., Kaplin V. V., Uglov S. R., Zabaev V. N., Skopik D. M., Silzer R. M., Retzlaff G. A. and Mikhalchuk A. A.Compact recycled beam source for XRL and EUVL exposure tools. : .

MLA

Piestrup M A, Powell M W, Cremer J T, Lombardo L W, Kaplin V V, Uglov S R, Zabaev V N, Skopik D M, Silzer R M, Retzlaff G A and Mikhalchuk A A.: . .