Plasma generation in a low-pressure hollow-cathode non-self-sustained glow discharge / I. V. Lopatin [et al.]

Уровень набора: High Temperature Material Processes: An International Quarterly of High-Technology Plasma ProcessesАльтернативный автор-лицо: Lopatin, I. V.;Akhmadeev, Y. K.;Koval, N. N., specialist in the field of electronics, Professor of Tomsk Polytechnic University, Doctor of technical sciences, 1948-, Nikolay Nikolaevich;Schanin, P. M.Язык: русский.Страна: Россия.Резюме или реферат: Research on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 1011 cm−3 at 15-A currents. Nitriding in the discharge plasma at 600°C for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 µm..Аудитория: .Тематика: труды учёных ТПУ
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Research on a hollow-cathode non-self-sustained glow discharge demonstrates the feasibility of discharge operation at pressures from 0.1 Pa. Depending on experimental conditions, the discharge operating voltage can reach ~50 V, which is much lower than that of a self-sustained glow discharge in the same electrode system. The discharge current can range up to 30 A. The working gas is Ar, N2, and N-based gas mixtures. Probe measurements of the discharge plasma show that the electron temperature varies between 1.5 and 7 eV, depending on the pressure of gas and its kind, and the plasma density can reach 1011 cm−3 at 15-A currents. Nitriding in the discharge plasma at 600°C for 2 h made it possible to increase the hardness of Ti (VT1-0) 3.5 times and that of 12Cr18Ni10Ti three times, with a modified layer depth of 35 µm.

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