The effect of Si content on structure and mechanical features of silicon-containing calcium phosphorus-based films deposited by rf-magnetron sputtering on titanium substrate treated by pulsed electron beam / M. A. Surmeneva [et al.]

Альтернативный автор-лицо: Surmeneva (Ryabtseva), M. A., specialist in the field of material science, engineer-researcher of Tomsk Polytechnic University, Associate Scientist, 1984-, Maria Alexandrovna;Surmenev, R. A., physicist, Associate Professor of Tomsk Polytechnic University, Senior researcher, Candidate of physical and mathematical sciences, 1982-, Roman Anatolievich;Tyurin, A. I.;Mukhametkaliev, T. M., physicist, research engineer at Tomsk Polytechnic University, 1991-, Timur Mukhamedrashidovich;Teresov, A. D.;Koval, N. N., specialist in the field of electronics, Professor of Tomsk Polytechnic University, Doctor of technical sciences, 1948-, Nikolay Nikolaevich;Pirozhkova, T. S.;Shuvarin, I. A.;Chudinova, E. A., physicist, laboratory assistant of Tomsk Polytechnic University, 1993-, Ekaterina Aleksandrovna;Syrtanov, M. S., physicist, engineer of Tomsk Polytechnic University, 1990-, Maksim SergeevichКоллективный автор (вторичный): Национальный исследовательский Томский политехнический университет (ТПУ), Физико-технический институт (ФТИ), Кафедра теоретической и экспериментальной физики (ТиЭФ), Центр технологий (ЦТ);Национальный исследовательский Томский политехнический университет (ТПУ), Физико-технический институт (ФТИ), Кафедра теоретической и экспериментальной физики (ТиЭФ);Национальный исследовательский Томский политехнический университет (ТПУ), Институт физики высоких технологий (ИФВТ), Кафедра сильноточной электроники (СЭ);Национальный исследовательский Томский политехнический университет (ТПУ), Физико-технический институт (ФТИ), Кафедра общей физики (ОФ)Язык: английский.Серия: Advanced Material & Nanotechnology • Nano-TechnologyРезюме или реферат: Silicon-containing calcium phosphate (Si-CaP)coatings were fabricated by radio frequency (rf) magnetronsputtering of targets prepared from hydroxyapatite (HA) powderwith different silicon content. A powder of Si-HA(Ca[10](PO[4])[6-x](SiO[4])[x](OH)[2-x], x=0.5 and 1.72) was prepared bymechanochemical activation and then used as a precursorpowderto prepare a target for sputtering. The titanium substratewas acid etched and treated with pulsed electron beam with anenergy density of 15 J/cm{2}. The phase composition and structure,nanohardness and Young’s modulus of Si-CaP coating depositedon titanium substrate were investigated by X-ray diffraction andnanoindentation test, respectively. The average crystallite size asdetermined by XRD was 28 nm for coatings obtained bysputtering of the target prepared from the Si-HA powder (x=0.5),whereas Si-CaP (Si-HA powder x=1.72) films showed anamorphous structure. The nanohardness and the Young’smodulus of the Si-HA coating (x=0.5) deposited on titaniumtreated by pulsed electron beam treatment are enhanced to 4.5and 113 GPa compared to titanium substrate. Increase of Sicontent resulted in a dramatic reduction of the nanohardness andYoung’s modulus of Si-CaP films. However, Si-CaP with thehighest Si content exhibited significantly lower values of elasticmodulus, but slightly higher values of H/E and H[3]/E[2], than didthe non-coated specimens. Therefore, the structure of films has asignificant effect on tribological and mechanical properties of thedeposited coatings. Rf-magnetron sputtering allowed to produceSi-CaP coatings with higher nanohardness and lower elasticmodulus compared to titanium substrate..Примечания о наличии в документе библиографии/указателя: [References: 13 tit.].Тематика: электронный ресурс | труды учёных ТПУ | распыление | фосфат кальция | нанотвердость | кремний | пленки | магнетронное распыление | ВЧ-распыление | электронные пучки | подложки Ресурсы он-лайн:Щелкните здесь для доступа в онлайн
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[References: 13 tit.]

Silicon-containing calcium phosphate (Si-CaP)coatings were fabricated by radio frequency (rf) magnetronsputtering of targets prepared from hydroxyapatite (HA) powderwith different silicon content. A powder of Si-HA(Ca[10](PO[4])[6-x](SiO[4])[x](OH)[2-x], x=0.5 and 1.72) was prepared bymechanochemical activation and then used as a precursorpowderto prepare a target for sputtering. The titanium substratewas acid etched and treated with pulsed electron beam with anenergy density of 15 J/cm{2}. The phase composition and structure,nanohardness and Young’s modulus of Si-CaP coating depositedon titanium substrate were investigated by X-ray diffraction andnanoindentation test, respectively. The average crystallite size asdetermined by XRD was 28 nm for coatings obtained bysputtering of the target prepared from the Si-HA powder (x=0.5),whereas Si-CaP (Si-HA powder x=1.72) films showed anamorphous structure. The nanohardness and the Young’smodulus of the Si-HA coating (x=0.5) deposited on titaniumtreated by pulsed electron beam treatment are enhanced to 4.5and 113 GPa compared to titanium substrate. Increase of Sicontent resulted in a dramatic reduction of the nanohardness andYoung’s modulus of Si-CaP films. However, Si-CaP with thehighest Si content exhibited significantly lower values of elasticmodulus, but slightly higher values of H/E and H[3]/E[2], than didthe non-coated specimens. Therefore, the structure of films has asignificant effect on tribological and mechanical properties of thedeposited coatings. Rf-magnetron sputtering allowed to produceSi-CaP coatings with higher nanohardness and lower elasticmodulus compared to titanium substrate.

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