The Deposition of Silicon-Carbon Coatings in Plasma Based Nonself-Sustained Arc Discharge with Heated Cathode / A. S. Grenadyorov [et al.]

Уровень набора: (RuTPU)RU\TPU\network\11477, Key Engineering Materials, Scientific JournalАльтернативный автор-лицо: Grenadyorov, A. S.;Oskomov, K. V.;Soloviev, A. A., specialist in the field of hydrogen energy, Associate Professor of Tomsk Polytechnic University, Candidate of technical sciences, 1977-, Andrey Aleksandrovich;Rabotkin, S. V.;Kovsharov, N. F.Коллективный автор (вторичный): Национальный исследовательский Томский политехнический университет (ТПУ), Физико-технический институт (ФТИ), Кафедра теоретической и экспериментальной физики (ТиЭФ)Язык: английский.Серия: Discharge and Plasma-Beam TechnologyРезюме или реферат: Silicon-carbon coatings on silicon substrates were deposited in plasma based nonself-sustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa..Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | алмазоподобный углерод | кремний-углерод | пленки | покрытия | плазма крови | дуговые разряды | катоды Ресурсы он-лайн:Щелкните здесь для доступа в онлайн
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Silicon-carbon coatings on silicon substrates were deposited in plasma based nonself-sustained arc discharge with heated cathode by plasma polymerization of silicon organic agent such as polyphenyl methylsiloxane (PPhMS). Silicon-carbon coatings were deposited at PPhMS flow rate of 0.012 ml/min, argon pressure of 0-0.1 Pa, discharge current of 5-8 A, discharge voltage of 130-150 V, and filament current of 68 A. Bipolar pulsed bias voltage was supplied on the substrate during coating deposition. Surface morphology, hardness and elastic modulus of silicon-carbon films were investigated after the deposition. The film surface is very smooth with root-mean-square roughness of 0.579 nm. Maximum hardness of coatings was 11 GPa, and maximum elastic modulus was 142 GPa.

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