Luminescence Control of Led Heterostructures Grown by Method of Metalorganic Vapor Phase Epitaxy on Sapphire / Li Zixuan, L. V. Vorobyova, V. I. Oleshko
Уровень набора: Russian Physics JournalЯзык: английский.Резюме или реферат: The paper presents the results of spectral and kinetic characteristics of pulse cathode- and photoluminescence of AlGaN/GaN and InGaN/GaN LED heterostructures grown on sapphire by metalorganic vapor phase epitaxy. The effect of high current electron beam energy density on the spectral and amplitude characteristics of luminescence spectra of heterostructures is studied. The spatial distribution of fluorescence characteristics on the wafer surface was studied. It is found that in some InGaN/GaN heterostructures, a shift of the maximum of stimulated cathodoluminescence spectra, measured at different points of the sample, is observed. This result is explained by variations in the composition and thickness of the quantum dimensional active region caused by nonideality of the wafer growth process..Примечания о наличии в документе библиографии/указателя: [References: 9 tit.].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | LED | heterostructure | superlattice | cathode- and photoluminescence Ресурсы он-лайн:Щелкните здесь для доступа в онлайнTitle screen
[References: 9 tit.]
The paper presents the results of spectral and kinetic characteristics of pulse cathode- and photoluminescence of AlGaN/GaN and InGaN/GaN LED heterostructures grown on sapphire by metalorganic vapor phase epitaxy. The effect of high current electron beam energy density on the spectral and amplitude characteristics of luminescence spectra of heterostructures is studied. The spatial distribution of fluorescence characteristics on the wafer surface was studied. It is found that in some InGaN/GaN heterostructures, a shift of the maximum of stimulated cathodoluminescence spectra, measured at different points of the sample, is observed. This result is explained by variations in the composition and thickness of the quantum dimensional active region caused by nonideality of the wafer growth process.
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