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141.
An accelerator facility for WDM, HEDP, and HIF investigations in Nazarbayev University / M. I. Kaykanov [et al.]Уровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesДоступность: :

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Vol. 712 : Advanced Materials for Technical and Medical Purpose (AMTMP 2016) : The Workshop , February 15-17, 2016, Tomsk, Russia : [proceedings] / National Research Tomsk Polytechnic University (TPU) ; eds. G. E. Osokin [et al.]Уровень набора: (RuTPU)RU\TPU\network\11477, Key Engineering Materials, Scientific Journal, Vol. 712 : Advanced Materials for Technical and Medical Purpose (AMTMP 2016)Публикация: 2016Доступность: :

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Pulsed electron beam propagation in gases under pressure of 6.6 kPa in drift tube / G. E. Kholodnaya [et al.]Уровень набора: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms = 1984-Доступность: :

145.
Research of chain plasmochemical synthesis of superdispersed silicon dioxide by pulsed electron beam / G. E. Remnev, A. I. PushkarevУровень набора: IEEJ Transactions on fundamentals and Mfterials = 1990-Доступность: :

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Modelling of chemical reactions in plasma / N. E. Aktaev, G. E. Remnev, A. P. YalovetsУровень набора: (RuTPU)RU\TPU\network\2008, IOP Conference Series: Materials Science and EngineeringДоступность: :

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Energy spectrum analysis for intense pulsed electron beam / J. Shen [et al.]Уровень набора: Laser and Particle BeamsДоступность: :

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Pulsed plasma chemical synthesis of SixCyOz composite nanopowder / G. E. Kholodnaya [et al.]Уровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesДоступность: :

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Solid oxide fuel cell anode surface modification by magnetron sputtering of NiO/YSZ thin film / A. A. Soloviev [et al.]Уровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesДоступность: :

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Flexible hard Al-Si-N films for high temperature operation / Y. Musil, G. E. Remnev, V. N. Legostaev [et al.]Уровень набора: Surface and Coatings TechnologyДоступность: :

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Synthesis of nanosized silicon dioxide in a chain plasma-chemical process / G. E. Remnev, A. I. PushkarevУровень набора: High Energy Chemistry = 2000-Доступность: :

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