Найдено 87 результатов.

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Результаты
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Ultra high fluence implantation of aluminum ions into CP–Ti / A. I. Ryabchikov [et al.]Уровень набора: Journal of Alloys and CompoundsДоступность: :

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Formation of repetitively pulsed high-intensity, low-energy silicon ion beams / A. I. Ryabchikov, D. O. Sivin, S. V. Dektyarev, A. E. ShevelevУровень набора: Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated EquipmentДоступность: :

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Formation of high-intensity axially symmetric and ribbon beams of low-energy metal ions / A. I. Ryabchikov, D. O. Sivin, A. E. Shevelev, G. S. ModebadzeУровень набора: Review of Scientific InstrumentsДоступность: :

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Ballistic formation of high-intensity low-energy gas ion beams / A. I. Ryabchikov, D. O. Sivin, A. E. Shevelev [et al.]Уровень набора: Review of Scientific InstrumentsДоступность: :

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Microstructure of titanium alloy modified by high-intensity implantation of low- and high-energy aluminium ions / A. I. Ryabchikov, D. O. Sivin, I. A. Bozhko [et al.]Уровень набора: Surface and Coatings TechnologyДоступность: :

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Temperature gradients in targets with high-intensity implantation and their influence on the characteristics of ion-modified layers / A. I. Ryabchikov, I. V. Lopatin, P. S. Ananin [et al.]Уровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesДоступность: :

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Low energy implantation of nitrogen ions by extended beam with a ballistic focusing in a stainless steel / A. I. Ryabchikov, Yu. K. Akhmadeev, I. V. Lopatin [et al.]Уровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesДоступность: :

75.
Plasma-immersion formation of high-intensity gaseous ion beams / A. I. Ryabchikov, D. O. Sivin, O. S. Korneva [et al.]Уровень набора: VacuumДоступность: :

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Surface modification of Al by high-intensity low-energy Ti-ion implantation: Microstructure, mechanical and tribological properties / A. I. Ryabchikov, E. B. Kashkarov, A. E. Shevelev [et al.]Уровень набора: Surface and Coatings TechnologyДоступность: :

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Low energy, high intensity metal ion implantation method for deep dopant containing layer formation / A. I. Ryabchikov, A. E. Shevelev, D. O. Sivin [et al.]Уровень набора: Surface and Coatings TechnologyДоступность: :

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Gas-discharge plasma application for ion-beam treatment of the holes' inner surfaces / D. O. Sivin, O. S. Korneva, A. I. Ivanova, D. O. VakhrushevУровень набора: (RuTPU)RU\TPU\network\3526, Journal of Physics: Conference SeriesДоступность: :