Radioactivation Monitoring of the Density of Wear-Resistant AlN and CrN Coatings on Silicon / V. A. Ryzhkov, V. A. Tarbokov, E. A. Smolyansky, G. E. Remnev
Уровень набора: Technical Physics LettersЯзык: английский.Резюме или реферат: A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings..Примечания о наличии в документе библиографии/указателя: [References: 5 tit.].Аудитория: .Тематика: электронный ресурс | труды учёных ТПУ | density | radioactivation analysis | magnetron | microinterferometer | плотность | радиоактивный анализ | магнетроны | износостойкие покрытия Ресурсы он-лайн:Щелкните здесь для доступа в онлайнTitle screen
[References: 5 tit.]
A combination of two methods (nondestructive proton beam radioactivation analysis and optical microinterferometry) has been used for measuring the mass and linear thicknesses of AlN and CrN coatings deposited onto silicon substrates by means of magnetron sputtering. It is established that, at linear thickness from 2.2 to 5.7 μm, the density of deposits is close to that of bulk materials (3.26 g/cm3 for AlN and 5.9 g/cm3 for CrN), while the stoichiometry of nitrides can be controlled by varying the parameters of magnetron sputtering. The proposed method can also be used for determining the densities of metal carbide and oxide films used as wear-resistant coatings.
Российский фонд фундаментальных исследований 20-21-00025/20
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